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US 2013/0280421 A1Published application
Method for manufacturing x-ray/gamma-ray focusing optical system using atomic layer deposition
AssigneePostech Academy-Industry Foundation
InventorsJung Ho Je, Jiwon Jung
Life of this patent
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Abstract
The present invention relates to a method for manufacturing an X-ray/γ-ray focusing optical system comprising the steps of: providing a capillary substrate; and sequentially accumulating a plurality of alternation layers, each consisting of an X-ray/γ-ray opaque material and an X-ray/γ-ray transparent material, on an inner surface of the capillary substrate in a Fresnel pattern by atomic layer deposition.
Claims14
A method of manufacturing an X-ray/γ-ray focusing optical system, comprising the steps of:
- providing a capillary substrate;
- and
- sequentially accumulating a plurality of alternation layers, each consisting of an X-ray/γ-ray opaque material and an X-ray/γ-ray transparent material, on an inner surface of the capillary substrate in a Fresnel pattern by atomic layer deposition.
Dependencies are inferred from the claim text.