Methods and apparatus for heat spreader on silicon
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsHsien-Wei Chen, Chung-Ying Yang, Chao-Wen Shih, Kai-Chiang Wu
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsHsien-Wei Chen, Chung-Ying Yang, Chao-Wen Shih, Kai-Chiang Wu
Estimating the term…
Apparatus and methods for forming a heat spreader on a substrate to release heat for a semi-conductor package are disclosed. The apparatus comprises a substrate. A dielectric layer is formed next to the substrate and in contact with a surface of the substrate. A heat spreader is formed next to the substrate and in contact with another surface of the substrate. A passivation layer is formed next to the dielectric layer. A connection pad is placed on top of the passivation layer. The substrate may comprise additional through-silicon-vias. The contact surface between the substrate and the heat spreader may be a scraggy surface. The packaging method further proceeds to connect a chip to the connection pad by way of a connection device such as a solder ball or a bump.
A structure for releasing heat for a semi-conductor package, comprising:
A method for fabricating a structure for semi-conductor package, comprising:
A structure for a semi-conductor package, comprising:
Dependencies are inferred from the claim text.