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US 2013/0258339 A1Published application
Wafer alignment mark scheme
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsWei-Hsiang TSENG, Chin-Hsiang LIN, Heng-Hsin LIU, Jui-Chun PENG, Ho-Ping CHEN
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Abstract
A wafer alignment apparatus includes a light source, a light detection device, and a rotation device configured to rotate a wafer. The light source is configured to provide light directed to a backside of the wafer. The light detection device is configured to detect reflected light intensity from the backside of the wafer to find a position of at least one wafer alignment mark formed on the back side of the wafer.
Claims20
A wafer alignment apparatus, comprising:
- a light source;
- a light detection device;
- and
- a rotation device configured to rotate a wafer,
- wherein the light source is configured to provide light directed to a backside of the wafer, the light detection device is configured to detect reflected light intensity from the backside of the wafer to find a position of at least one wafer alignment mark formed on the back side of the wafer.
2 more elements
A method, comprising:
- transmitting light from a light source to a backside of a wafer;
- rotating the wafer for a specified angle;
- detecting reflected light from the backside of the wafer by a light detection device;
- and
- finding a position of at least one wafer alignment mark formed on the backside of the wafer.
2 more elements
A wafer, comprising:
- a front side for integrated circuit formation;
- a back side;
- and
- at least one wafer alignment mark formed on the back side,
- wherein the at least one wafer alignment mark is configured to change a light intensity reflected from the back side in order to find a position of the at least one wafer alignment mark.
2 more elements
Dependencies are inferred from the claim text.