Exposure apparatus, method of controlling the same and method of manufacturing device
AssigneeCanon Kabushiki Kaisha
InventorNoritoshi SAKAMOTO
Life of this patent
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Abstract
An exposure apparatus exposes a resist on a substrate to light via an optical system. The exposure apparatus includes: a table configured to position the substrate at an exposure position upon holding the substrate; an obtaining unit configured to obtain a distance from an alignment mark formed on the substrate to a resist surface, and a tilt of the resist surface; and a control unit configured to calculate a correction value for correcting a shift in exposure position, that occurs upon tilt correction of the table, so as to reduce the tilt of the resist surface, using the distance and the tilt, and control a position of the table in accordance with the correction value.
Claims10
An exposure apparatus which exposes a resist on a substrate to light via an optical system, the apparatus comprising:
- a table configured to position the substrate at an exposure position upon holding the substrate;
- an obtaining unit configured to obtain a distance from an alignment mark formed on the substrate to a resist surface, and a tilt of the resist surface;
- and
- a control unit configured to calculate a correction value for correcting a shift in exposure position, that occurs upon tilt correction of said table, so as to reduce the tilt of the resist surface, using the distance and the tilt, and control a position of said table in accordance with the correction value.
A method of controlling an exposure apparatus which includes a table which positions a substrate at an exposure position upon holding the substrate, and exposes a resist on the substrate to light via an optical system, the method comprising:
- an obtaining step of obtaining a distance from an alignment mark formed on the substrate to a resist surface, and a tilt of the resist surface;
- a calculation step of calculating a correction value for correcting a shift in exposure position, that occurs upon tilt correction of the table, so as to reduce the tilt of the resist surface, using the distance and the tilt;
- and
- a control step of controlling a position of the table in accordance with the correction value calculated in the calculation step.
Dependencies are inferred from the claim text.