Extreme ultraviolet light source apparatus
AssigneeGigaphoton Inc.
InventorsKouji KAKIZAKI, Shinji NAGAI, Tatsuya YANAGIDA
Life of this patent
Estimating the term…
Abstract
An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.
Claims26
An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma, the apparatus comprising:
- a chamber in which the extreme ultraviolet light is generated;
- an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber;
- and
- a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.
Dependencies are inferred from the claim text.