Apparatus for contaminants being deposited thereon

A particle beam device, comprising:

• at least one beam generator for generating a particle beam;
• at least one holding element for holding an object;
• at least one objective lens for imaging or focussing said particle beam;
• and
• at least one apparatus for contaminants being deposited thereon, wherein said apparatus comprises at least one cooling unit, at least one aperture unit, and at least one motion device for moving said aperture unit relative to said cooling unit, wherein said aperture unit is arranged at the motion device, wherein said aperture unit has at least one aperture opening, and wherein said cooling unit is connected to said aperture unit by at least one first flexible thermal conductor.

An apparatus for contaminants being deposited thereon in a particle beam device, comprising:

• at least one cooling unit;
• at least one aperture unit;
• and
• at least one motion device for moving said aperture unit relative to the cooling unit, wherein said aperture unit is arranged at the motion device, wherein said aperture unit has at least one aperture opening, and wherein said cooling unit is directly connected to said aperture unit by at least one first flexible thermal conductor.

A particle beam device, comprising:

• at least one beam generator for generating a particle beam;
• at least one holding element for holding an object;
• at least one objective lens for imaging or focusing said particle beam;
• and
• at least one apparatus for contaminants being deposited thereon, wherein said apparatus comprises at least one cooling unit, at least one aperture unit, and at least one motion device for moving said aperture unit relative to said cooling unit, wherein said aperture unit is arranged at the motion device, wherein said aperture unit has at least one aperture opening, and wherein said cooling unit is directly connected to said aperture unit by at least one first flexible thermal conductor.

An apparatus for contaminants being deposited thereon in a particle beam device, comprising:

• at least one cooling unit;
• at least one aperture unit;
• and
• at least one motion device for moving said aperture unit relative to the cooling unit, wherein said aperture unit is arranged at the motion device, wherein said aperture unit has at least one aperture opening, and wherein at least one first flexible thermal conductor is arranged at said cooling unit and said aperture unit.

A particle beam device, comprising:

• at least one beam generator for generating a particle beam;
• at least one holding element for holding an object;
• at least one objective lens for imaging or focusing said particle beam;
• and
• at least one apparatus for contaminants being deposited thereon, wherein said apparatus comprises at least one cooling unit, at least one aperture unit, and at least one motion device for moving said aperture unit relative to said cooling unit, wherein said aperture unit is arranged at the motion device, wherein said aperture unit has at least one aperture opening, and wherein at least one first flexible thermal conductor is arranged at said cooling unit and said aperture unit.