Substrate treatment apparatus and substrate treatment method

A substrate treatment method comprising:

• a holding/rotating step of causing a substrate holding/rotating unit to horizontally hold a substrate in a chamber and rotate the substrate about a vertical rotation axis extending through the substrate;
• a treatment liquid supplying step of, simultaneously with the holding/rotating step, spouting a treatment liquid from a treatment liquid supplying unit toward a center portion of the substrate held by the substrate holding/rotating unit;
• a temperature measuring step of, before the treatment liquid supplying step, causing a temperature measuring unit to measure at least one of an internal air temperature of the chamber and a temperature of the treatment liquid to be spouted from the treatment liquid supplying unit;
• a target value setting step of, after the temperature measuring step, setting a target value of the internal air temperature of the chamber or the temperature of the treatment liquid to be spouted from the treatment liquid supplying unit based on a measurement value detected by the temperature measuring unit and a map which defines a relationship between the air temperature and the treatment liquid temperature so that a treatment liquid temperature level for a given air temperature level is lower than the given air temperature level;
• and
• a temperature controlling step of, before the treatment liquid supplying step, controlling a temperature adjusting unit so that the internal air temperature of the chamber or the temperature of the treatment liquid to be spouted from the treatment liquid supplying unit is adjusted closer to the target value.