US 2013/0256262 A1Published application

In Situ Manufacturing Process Monitoring System of Extreme Smooth Thin Film and Method Thereof

AssigneeNational Applied Research Laboratories

InventorsChien-Nan Hsiao, Po-Kai Chiu, Da-Ren Liu, James Su, Fong-Zhi Chen

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Abstract

An in situ manufacturing process monitoring system of extreme smooth thin film and method thereof, comprising a coating device for coating a thin film on at least one substrate during a coating process, an ion figuring device for processing a surface polishing process on the thin film, a control device electrically coupled to the coating device and the ion figuring device respectively for controlling the coating device and the ion figuring device processing the coating process and surface polishing process by adjusting at least one device parameter of the coating device and the ion figuring device, and an in situ monitoring device electrically coupled to the control device for in situ monitoring at least one optical parameter of the thin film.

Claims10

Dependent claims

An in situ manufacturing process monitoring system of extreme smooth thin film, comprising:

a coating device, for performing a coating process to form a thin film on at least one substrate;
an ion figuring device, for performing a surface polishing process of the thin film;
a control device, electrically coupled to the coating device and the ion figuring device, for adjusting at least one device parameter of the coating device and the ion figuring device to perform the coating process or the surface polishing process;
and
an in situ monitoring device, electrically coupled to the control device, for in situ monitoring at least one optical parameter of the thin film;
wherein, the control device obtains a thickness of the thin film by using the optical parameter, and if the thickness reaches a first predetermined value during the coating process, the control device controls the coating device to stop the coating process and controls the ion figuring device to start the surface polishing process;
if the thickness reaches a second predetermined value during the surface polishing process, the control device controls the ion figuring device to stop the surface polishing process;
wherein, the coating device and the ion figuring device are contained in a vacuum chamber, and both the coating process and the surface polishing process are completed in the vacuum chamber without breaking the vacuum condition.

5 more elements

An in situ manufacturing monitoring method of thin film, comprising the steps of:

using a coating device to perform a coating process to form a thin film on at least one substrate;
using an in situ monitoring device to in situ monitor at least one optical parameter of the thin film, and using the at least one optical parameter to determine whether a thickness of the thin film has reached a first predetermined value;
using a control device to control the coating device to stop the coating process and to control an ion figuring device to start a surface polishing process if the thickness of the thin film has reached the first predetermined value;
using the in situ monitoring device to in situ monitor the at least one optical parameter of the thin film to determine whether the thickness of the thin film has reached a second predetermined value when the surface polishing process takes place;
and
using the control device to control the ion figuring device to stop the surface polishing process if the thickness of the thin film has reached the second predetermined value;
wherein the coating device and the ion figuring device are contained in a vacuum chamber, and both the coating process and the surface polishing process are completed in the vacuum chamber without breaking the vacuum condition.

4 more elements

Dependencies are inferred from the claim text.