Gas delivery systems and methods of use thereof
AssigneeApplied Materials, Inc.
InventorsZHIYUAN YE, BALASUBRAMANIAN RAMACHANDRAN, DENNIS DEMARS
Life of this patent
Estimating the term…
Abstract
Gas delivery systems and methods of use thereof is provided herein. In some embodiments, a gas delivery system may include a first gas supply to provide a first gas along a first flow path; a flow divider disposed in the first flow path to divide the first flow path into a plurality of second flow paths leading to a plurality of corresponding gas delivery zones; and a plurality of second gas supplies respectively coupled to corresponding ones of the second flow paths to independently provide a second gas to respective ones of the plurality of second flow paths.
Claims20
A gas delivery system, comprising:
- a first gas supply to provide a first gas along a first flow path;
- a flow divider disposed in the first flow path to divide the first flow path into a plurality of second flow paths leading to a plurality of corresponding gas delivery zones;
- and
- a plurality of second gas supplies respectively coupled to corresponding ones of the second flow paths to independently provide a second gas to respective ones of the plurality of second flow paths.
A substrate processing system, comprising:
- a chamber body having a substrate support for supporting a substrate disposed within an inner volume of the chamber body, the inner volume having a plurality of gas delivery zones;
- a first gas supply to provide a first gas to the inner volume;
- a flow divider disposed between the first gas supply and the chamber body to divide a flow of the first gas from the first gas supply into a plurality of flow paths fluidly coupled to respective ones of the plurality of gas delivery zones;
- and
- a plurality of second gas supplies, one each respectively coupled to corresponding flow paths of the plurality of flow paths to independently provide a second gas to the plurality of flow paths.
A method of processing a substrate, comprising:
- dividing a flow of a first gas from a first gas supply into a plurality of flow paths coupled to a corresponding plurality of gas delivery zones of a process chamber for processing a substrate;
- and
- providing a flow of a second gas to each of the plurality of flow paths independently of the flow of the first gas to form independently controllable mixtures of the first gas and the second gas flowing into each of the plurality of gas delivery zones.
Dependencies are inferred from the claim text.