Substrate cleaning apparatus and substrate processing apparatus including the substrate cleaning apparatus
AssigneeSCREEN Semiconductor Solutions Co., Ltd.
InventorKoji NISHIYAMA
Life of this patent
Estimating the term…
Abstract
An ULPA filter is arranged at the upper portion in a casing. Air outside of the casing is supplied to the ULPA filter through a duct. Clean air that has passed through the ULPA filter is led to an opening of a spin plate through a passage forming member, a connection member, a base, a motor supporting member and a rotating shaft of a spin motor. The spin chuck holds a substrate such that the upper surface of the substrate is opposite to the spin plate. In this state, the spin motor operates, causing the spin plate to rotate and thus the lower surface of the rotating substrate to be cleaned by a cleaning brush.
Claims8
A substrate cleaning apparatus that cleans a lower surface of a substrate, comprising:
- a rotating member that is provided to be rotatable around a rotation axis extending in a vertical direction and has an opening at the center thereof;
- a rotation-driving device that is provided on an upper side of said rotating member to rotate said rotating member;
- a holding member that is provided on a lower side of said rotating member to hold the substrate with an upper surface of the substrate being opposite to said rotating member;
- an air supplying mechanism that supplies air to a space between the substrate held by said holding member and said rotating member through the opening of said rotating member;
- and
- a cleaning mechanism that cleans the lower surface of the substrate held by said holding member, wherein
- said air supplying mechanism includes
- a filter,
- an air supplier that supplies air to said filter, and
- an air passage configured to lead the air that has passed through said filter to the opening of said rotating member.
Dependencies are inferred from the claim text.