# US 2013/0252016 A1 · Metamaterial thin films > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2013/0252016 A1 - Document ID: US20130252016A1 - Status: Published application - Kind: A1 - Application number: 13/784,856 - Filed: 2013-03-05 - Published: 2013-09-26 - Earliest claimed: 2012-03-05 - Assignees: The United States of America as represented by the Secretary of the Navy - Inventors: Orest J. Glembocki; Sharka M. Prokes; Joshua D. Caldwell; Mikko Ritala; Markku Leskela; Jaakko Niinisto; Eero Santala; Timo Hatanpaa; Maarit Kariemi - Web page: https://patentgrep.com/patent/US20130252016A1 ## CPC - B32B 3/28: characterised by a layer comprising a deformed thin sheet {, i.e. the layer having its entire thickness deformed out of the plane}, e.g. corrugated, crumpled (B32B29/08 takes precedence) - B32B 15/04: comprising metal as the main or only constituent of a layer, {which is} next to another layer of {the same or of} a {different material (next to a bituminous or tarry layer B32B11/08; next to a water-setting substance layer B32B13/06; next to a glass layer B32B17/061; next to a cellulosic plastic layer B32B23/042)} - C23C 16/06: characterised by the deposition of metallic material - C23C 16/18: from metallo-organic compounds - C23C 16/45542: {Plasma being used non-continuously during the ALD reactions} - C23C 16/50: using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)} - Y10T 428/1241: Nonplanar uniform thickness or nonlinear uniform diameter [e.g., L-shape] - Y10T 428/24636: Embodying mechanically interengaged strand[s], strand-portion[s] or strand-like strip[s] [e.g., weave, knit, etc.] - Y10T 428/24736: Ornamental design or indicia - B32B: LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION ## Abstract A metamaterial thin film with plasmonic properties formed by depositing metallic films by atomic layer deposition onto a substrate to form a naturally occurring mosaic-like nanostructure having two-dimensional features with air gaps between the two-dimensional features. Due to the unique deposition nanostructure, plasmonic thin films of metal or highly conducting materials can be produced on any substrate, including fabrics and biological materials. In addition, these plasmonic materials can be used in conjunction with geometric patterns that may be used to create multiple resonance plasmonic metamaterials. ## Claims ### Claim 1 A method of making a metamaterial thin film, comprising: depositing a metallic or metallic-like material using atomic layer deposition or related process onto an arbitrary substrate to form a mosaic-like surface morphology comprising two dimensional nanostructure features resembling corrugations and comprising air gaps between the two dimensional features; wherein after deposition the metallic or metallic-like material exhibits plasmonic and/or metamaterial properties. ### Claim 2 (depends on 1) The method of claim 1, wherein the metallic or metallic-like material is deposited using plasma enhanced atomic layer deposition. ### Claim 3 (depends on 1) The method of claim 1, wherein the metallic or metallic-like material comprises Au, Ag, Ru, Pt, Jr, Rh, Pd, Ta, Ti, Cu Mo, Ni, W, Co, Fe, or any combination thereof. ### Claim 4 (depends on 1) The method of claim 1, wherein the metallic or metallic-like material comprises Ag. ### Claim 5 (depends on 1) The method of claim 1, wherein the substrate is any non-liquid and non-gas substance. ### Claim 6 (depends on 1) The method of claim 1, wherein the substrate is a metal, semiconductor, insulator, ceramic, fabric, paper, swab, cloth, plastic, or any combination thereof. ### Claim 7 (depends on 1) The method of claim 1, wherein the substrate has one or more pre-defined geometric patterns. ### Claim 8 (depends on 1) The method of claim 1, wherein the substrate has a pre-defined spoof-plasmon or hybrid-spoof—plasmon structure and a dielectric overlayer ### Claim 9 (depends on 1) The method of claim 1, wherein a dielectric spacer layer and subsequently deposited spoof or hybrid-spoof plasmon film are deposited on top of the ALD or PEALD film ### Claim 10 (depends on 1) The method of claim 1, wherein plasmonic enhancement varies with material thickness, width of the gaps and/or size of the two-dimensional mosaic features. ### Claim 11 A metamaterial thin film made by the method comprising: depositing a metallic or metallic-like material using atomic layer deposition onto a substrate to form a mosaic-like surface morphology comprising two-dimensional features resembling corrugations and comprising air gaps between the two dimensional features; wherein after deposition the metallic or metallic like material exhibits plasmonic properties. ### Claim 12 (depends on 11) The metamaterial thin film of claim 11, wherein the metallic or metallic-like material is deposited using plasma enhanced atomic layer deposition. ### Claim 13 (depends on 11) The metamaterial thin film of claim 11, wherein the metallic or metallic-like material comprises Au, Ag, Ru, Pt, Ir, Rh, Pd, Ta, Ti, Cu Mo, Ni, W, Co, Fe, or any combination thereof. ### Claim 14 (depends on 11) The metamaterial thin film of claim 11, wherein the metallic or metallic-like material comprises Ag. ### Claim 15 (depends on 11) The metamaterial thin film of claim 11, wherein the substrate is any non-liquid and non-gas substance. ### Claim 16 (depends on 11) The metamaterial thin film of claim 11, wherein the substrate is a metal, semiconductor, insulator, ceramic, fabric, paper, swab, cloth, plastic, or any combination thereof. ### Claim 17 (depends on 11) The metamaterial thin film of claim 11, wherein the substrate has one or more geometric patterns. ### Claim 18 (depends on 11) The metamaterial thin film of claim 11, wherein plasmonic enhancement varies with material thickness and size of the two dimensional features.