Patterning in the directed assembly of block copolymers using triblock or multiblock copolymers
AssigneeWisconsin Alumni Research Foundation
InventorsPaul Franklin Nealey, Shengxiang Ji
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Abstract
Provided herein are block copolymer thin film structures and methods of fabrication. The methods involve directing the assembly of ABA triblock copolymers such that desired features are formed by domains of the assembled ABA triblock copolymer. In some embodiments, an ABA triblock copolymer is directed to assemble by a chemical pattern. Chemical patterns with periods much different than the natural period of the ABA triblock copolymer may be used to direct assembly of the ABA triblock copolymer.
Claims20
A method comprising:
- depositing a layer of material comprising an ABA triblock copolymer on a pattern;
- and
- inducing microphase separation of the ABA triblock copolymer to thereby replicate the pattern in the layer.
A structure comprising a thin film overlying a pattern, wherein the thin film comprises microphase-separated domains of an ABA triblock copolymer and wherein the pattern is replicated in the thin film.
A structure comprising a thin film overlying a pattern having a pattern period Ls, wherein the thin film comprises microphase-separated domains of a block copolymer that has a bulk period Lo, the pattern is replicated in the thin film and Ls is at least about 1.2 Lo.
Dependencies are inferred from the claim text.