Device Adapted to Withdraw Gas and to Control Gas Flow Rate Discharged Therefrom
AssigneePro-Iroda Industries, Inc.
InventorsCheng-Nan Yang, Lung-Yin Lin
Life of this patent
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AssigneePro-Iroda Industries, Inc.
InventorsCheng-Nan Yang, Lung-Yin Lin
Estimating the term…
A device includes a filling valve, a sleeve, an absorbing member, and a gas control unit. The filling valve can be engaged for filling liquid gas. The sleeve includes a fluid passing section that enables liquid gas outside to flow therein. The absorbing member can absorb liquid gas and is disposed in the sleeve. The gas control unit includes a main body, a gas inlet and flow rate adjusting mechanism, and a gas outlet mechanism. The gas inlet and flow rate adjusting mechanism includes an adjustably movable valve and a first air seal. The first air seal is mounted between the adjustably movable valve and the main body to prevent liquid gas from passing therebetween. The adjustably movable valve is in fluid communication with the gas outlet mechanism such that vaporized gas emitted from the absorbing member is discharged from the device from the gas outlet mechanism.
A device adapted to withdraw gas and to control the gas flow rate discharged therefrom comprising:
Dependencies are inferred from the claim text.