Plasma processing device
AssigneeEmd Corporation
InventorsYuichi Setsuhara, Akinori Ebe
Life of this patent
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Abstract
A plasma processing device has: a metallic vacuum chamber; an antenna-placing section in which a radio-frequency antenna is placed inside a through-hole (hollow space) provided in an upper wall of the vacuum chamber; and a dielectric separating plate covering the entire inner surface of the upper wall. In this plasma processing device, the entire inner surface side of the upper wall is covered with the separating plate so that surfaces in different level otherwise formed when a smaller separating plate is used is not formed between the inner surface and the separating plate. Therefore, the generation of particles caused by the formation of adhered materials on the surfaces in different level is prevented.
Claims12
A plasma processing device, comprising:
- a) a closed chamber for performing a plasma processing inside thereof, the closed chamber having a wall which is surrounded by a substantially-orthogonal edge line;
- b) an antenna-placing section provided between an inner surface and an outer surface of the wall, the antenna-placing section being a hollow space with an opening on a side of the inner surface;
- c) a radio-frequency antenna placed in the antenna-placing section;
- and
- d) a dielectric separating plate covering an entire portion of the inner surface of the wall that is surrounded by the substantially-orthogonal edge line.
Dependencies are inferred from the claim text.