Method and apparatus for precursor delivery

A system for processing a substrate using a precursor delivery apparatus, comprising:

• a process chamber for processing a substrate;
• an ampoule having a body with a first volume to hold a liquid precursor, an inlet to receive the liquid precursor and a carrier gas, and an outlet to flow a gas mixture of the liquid precursor and the carrier gas from the ampoule, wherein the outlet is coupled to the process chamber to deliver the gas mixture from the ampoule to an inner volume of the process chamber;
• a first heater disposed proximate to or in the first volume to heat the liquid precursor disposed in the first volume proximate to or at a location within the first volume where the liquid precursor contacts the carrier gas;
• a heat transfer apparatus disposed about the body to at least one of provide heat to or remove heat from the ampoule;
• a liquid precursor source coupled to the inlet of the ampoule to provide the liquid precursor to the ampoule without disconnecting the ampoule from the process chamber;
• and
• a carrier gas source coupled to the inlet of the ampoule to provide the carrier gas, wherein the liquid precursor and the carrier gas are coupled to the inlet in a manner to alternately supply the liquid precursor and the carrier gas to the inlet of the ampoule.