A plasma spray method for the manufacture of an ion conducting membrane, in particular of a hydrogen ion conducting membrane or of an oxygen ion conducting membrane, wherein the membrane is deposited as a layer (11, 111) on a substrate (10,110) in a process chamber (12), wherein a starting material (P) is sprayed onto a coating surface (31, 131) of the substrate (10, 110) by means of a process gas (G) in the form of a process beam (2), wherein the starting material is injected into a plasma at a low process pressure which is at most 10000 Pa and is partially or completely melted there,
- characterized in that
- the substrate (10, 110) has pores (30) which are connected amongst one another so that the substrate (10, 110) is gas permeable and a portion of an overall pore area of an overall area of the coating surface (31, 131) amounts to at least 30%, in particular to at least 40%.