Semiconductor equipment

Semiconductor equipment, comprising:

• a reaction chamber, wherein at least one dirty portion to be cleaned is positioned within said reaction chamber;
• a movable frame, wherein said movable frame is disposed within said reaction chamber, said movable frame being capable of carrying a susceptor;
• a first cleaning brush head, wherein said first cleaning brush head is capable of touching said dirty portion and having an arrangement capable of movement relative to said dirty portion for removal residue attached to said dirty portion;
• and
• a second cleaning brush head, wherein said second cleaning brush head is disposed on a cleaning device, said cleaning device has a driving device, and said driving device is capable of making said second cleaning brush head move or rotate;
• wherein said dirty portion is positioned on an upper portion of said reaction chamber and comprises a showerhead positioned on the upper portion of said reaction chamber, said dirty portion is positioned on an upper portion of said reaction chamber, said first cleaning brush head is disposed on said susceptor, said movable frame is capable of moving vertically so as to make said first cleaning brush head touch said dirty portion, and said movable frame is capable of rotating so as to make said first cleaning brush head move relative to said dirty portion for removing said residue attached to said dirty portion.