Method for manufacturing a photovoltaic cell comprising a tco layer
AssigneeExcico Group
InventorThierry Emeraud
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Abstract
A method for fabricating a photovoltaic device, including depositing a TCO-layer on a substrate and annealing the TCO layer by laser irradiation having irradiation parameters, wherein the irradiation parameters are selected such that the annealing includes increasing the haze % of the TCO layer compared to the as deposited TCO layer. Additionally, a TCO layer having a haze % of at least 2% in the visible light wavelength range and a surface roughness of less than 0 nanometer RMS, and a photovoltaic device including such TCO-layer.
Claims13
A method for fabricating a photovoltaic device, comprising depositing a TCO-layer on a substrate, and annealing the TCO layer by laser irradiation having irradiation parameters,
- wherein the irradiation parameters are selected such that the annealing comprises increasing the haze % of the TCO layer compared to the as deposited TCO layer.
A TCO layer having a haze % of at least 2% in the visible light wavelength range and a surface roughness of less than 10 nanometer RMS.
Dependencies are inferred from the claim text.