Adjustable brush cleaning apparatus for semiconductor wafers and associated methods
AssigneeSTMicroelectronics S.r.l.
InventorJohn H. Zhang
Life of this patent
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Abstract
A cleaning apparatus for cleaning a semiconductor wafer includes a rotary brush to be positioned to clean the semiconductor wafer, and an optical sensing device associated with the rotary brush to sense a separation distance between a reference position thereon and the semiconductor wafer. An actuator is coupled to the optical sensing device to position the rotary brush based upon the sensed separation distance.
Claims21
A cleaning apparatus for cleaning a semiconductor wafer comprising:
- at least one rotary brush configured to be positioned to clean the semiconductor wafer;
- at least one optical sensing device associated with said at least one rotary brush to sense a separation distance between a reference position thereon and the semiconductor wafer;
- and
- at least one actuator coupled to said at least one optical sensing device and configured to position the at least one rotary brush based upon the sensed separation distance.
A cleaning apparatus for cleaning a semiconductor wafer comprising:
- at least one rotary brush configured to be positioned to clean a surface of the semiconductor wafer;
- at least one optical sensing device comprising
- a transmitter for transmitting an optical signal to the surface of the semiconductor wafer, and
- a receiver for receiving a reflected optical signal from the surface of the semiconductor wafer to sense the separation distance;
- and
- at least one actuator coupled to said at least one optical sensing device and configured to position the at least one rotary brush based upon the sensed separation distance.
A method for cleaning a semiconductor wafer with a cleaning apparatus comprising at least one rotary brush, at least one optical sensing device associated with the at least one rotary brush, and at least one actuator coupled to the at least one rotary brush, the method comprising:
- positioning the at least one rotary brush to clean the semiconductor wafer;
- operating the at least one optical sensing device associated with the at least one rotary brush to sense a separation distance between a reference position thereon and the semiconductor wafer;
- and
- operating the at least one actuator to position the at least one rotary brush based upon the sensed separation distance.
Dependencies are inferred from the claim text.