Vapor deposition device, vapor deposition method, and method for producing organic electroluminescence display device
AssigneeSharp Kabushiki Kaisha
InventorsTohru Sonoda, Shinichi Kawato, Satoshi Inoue
Life of this patent
Estimating the term…
Abstract
A vapor deposition device (50) disclosed, a partition wall (26) standing between film formation regions on a film formation substrate (200), includes: a mask unit (80) including a shadow mask (81) and a vapor deposition source (85) fixed in position relative to each other; contacting means for bringing the film formation substrate (200) and the shadow mask (81) into contact with each other at the partition wall (26); and moving means for moving at least a first one of the mask unit (80) and the film formation substrate (200) relative to a second one thereof in a state in which the contact caused by the contacting means is kept.
Claims24
(canceled)
A vapor deposition device for forming, on a film formation substrate on which the film is to be formed, a film having a predetermined pattern, the film formation substrate having a partition wall that has a predetermined height and that stands between film formation regions on the film formation substrate,
- the vapor deposition device comprising:
- a mask unit provided so as to face the film formation substrate and so as to include:
- a vapor deposition mask that has an opening and that is smaller in area than a vapor deposition region of the film formation substrate, wherein the vapor deposition mask includes an engaging section for engaging with the partition wall;
- and
- a vapor deposition source that has an emission hole for emitting a vapor deposition particle, the emission hole being provided so as to face the vapor deposition mask,
- the vapor deposition mask and the vapor deposition source being fixed in position relative to each other;
- contacting means for bringing the film formation substrate and the vapor deposition mask into contact with each other at the partition wall;
- and
- moving means for moving at least a first one of the mask unit and the film formation substrate relative to a second one thereof in a state in which the vapor deposition mask and the film formation substrate are in contact with each other at the partition wall.
23-28. (canceled)
Dependencies are inferred from the claim text.