Methods and processes for optical interferometric or holographic test in the development, evaluation, and manufacture of semiconductor and free-metal devices utilizing anisotropic and isotropic materials

A method for testing, developing, and evaluating a device under test, or evaluating the manufacture thereof comprising:

• (a) providing a beam of light from at least one light source having a first wavelength;
• the beam having at least one of the following attributes;
• a wavelength, a coherence, a phase, a polarization, an amplitude, or a phase-conjugate waveform,
• (b) imposing said beam of light on a test device having at least a surface, a volume, an interior surface, or an interior structure, over a spatial region within said device substantially greater than said first wavelength or equal to said first wavelength,
• (c) imposing said beam of light on a test device over a spatial region within or incident to said device wherein said test device has a first state of stress,
• (d) imposing said beam of light on said test device over a spatial region within said test device substantially greater than said first wavelength or equal to said first wavelength, wherein said test device has a second state of stress,
• (e) imposing a second light source having a different wavelength or polarization than the first light source being imposed upon the device under test or the detector device to interfere with the first beam as to produce an interference pattern short than the first wavelength of the light source incident to the device under test,
• (f) obtaining data resulting from the interference of first said beam and said second beam within or incident to said device under test representative of an incident external or internal stress or stresses acting upon and the effects thereof upon said region,
• (g) recording or electronically storing a plurality of interference images of said data, wherein said data records at least one or more of the following attributes:
• a position, a polarization, a wavelength, a phase, an amplitude, a phase-conjugate waveform, an intensity, a computer generated hologram or interferogram or holographic optical element, a displacement, a volume, a hologram or holographic optical element recorded or manufactured as to interfere with one or wavelengths or polarizations or a combination thereof, a voltage displacement contour, a shape, a size, a pattern, a feature, a structure, an orientation, a static state, or a change therein from the first or subsequent state, and analyzing a plurality of said interference data and images to determine the presence of, and
• (h) characterizing or the physically displaying effects or the analysis thereof of at least one stress or stresses acting upon, or within, or incident to, the device under test or evaluation.

A method for testing, developing, and evaluating a device under test, or evaluating the manufacture thereof comprising:

• (a) providing a beam of light from at least one light source having a first wavelength;
• the beam having at least one of the following attributes;
• a wavelength, a coherence, a phase, a polarization, an amplitude, or a phase-conjugate waveform,
• (b) imposing said beam of light on a test device having at least a surface, a volume, an interior surface, or an interior structure, over a spatial region within said device substantially greater than said first wavelength or equal to said first wavelength,
• (c) imposing said beam of light on a test device over a spatial region within or incident to said device wherein said test device has a first state of stress,
• (d) imposing said beam of light on said test device over a spatial region within said test device substantially greater than said first wavelength or equal to said first wavelength, wherein said test device has a second state of stress,
• (e) adjusting the angle of the second beam relative to the first beam to the device under test or adjusting the angle of the second beam to the detection device or devices relative to the first beam incident to the device under test,
• (f) obtaining data resulting from the interference of first said beam and said second beam within or incident to said device under test representative of an incident external or internal stress or stresses acting upon and the effects thereof upon said region,
• (g) varying said stress or the effects thereof, or any combination thereof, to test, determine, evaluate, or shape the device under test,
• (h) recording or electronically storing a plurality of interference images of said data, wherein said data records at least one or more of the following attributes:
• a position, a polarization, a wavelength, a phase, an amplitude, a phase-conjugate waveform, an intensity, a displacement, a volume, a voltage displacement contour, a shape, a size, a pattern, a feature, a structure, an orientation, a static state, or a change therein from the first or subsequent state, and analyzing a plurality of said interference data and images to determine the presence of, and
• (i) characterizing or the physically displaying effects or the analysis thereof of at least one stress or stresses acting upon, or within, or incident to, the device under test or evaluation.