Silica-based material and process for producing the same, noble metal supported material and process for producing carboxylic acids by using the same as catalyst
AssigneeAsahi Kasei Chemicals Corporation
InventorsKen Suzuki, Tatsuo Yamaguchi, Chihiro Iitsuka
Life of this patent
Estimating the term…
Abstract
A silica-based material comprising: silicon; aluminum; at least one fourth period element selected from the group consisting of iron, cobalt, nickel and zinc; and at least one basic element selected from the group consisting of alkali metal elements, alkali earth metal elements and rare earth elements, wherein the silica-based material comprises 42 to 90 mol % of the silicon, 3 to 38 mol % of the aluminum, 0.5 to 20 mol % of the fourth period element and 2 to 38 mol % of the basic element, based on a total mole of the silicon, the aluminum, the fourth period element and the basic element.
Claims14
A silica-based material comprising:
- silicon;
- aluminum;
- at least one fourth period element selected from the group consisting of iron, cobalt, nickel and zinc;
- and
- at least one basic element selected from the group consisting of alkali metal elements, alkali earth metal elements and rare earth elements,
- wherein the silica-based material comprises 42 to 90 mol % of the silicon, 3 to 38 mol % of the aluminum, 0.5 to 20 mol % of the fourth period element and 2 to 38 mol % of the basic element, based on a total mole of the silicon, the aluminum, the fourth period element and the basic element.
A process for producing a silica-based material comprising silicon, aluminum, at least one fourth period element selected from the group consisting of iron, cobalt, nickel and zinc and at least one basic element selected from the group consisting of alkali metal elements, alkali earth metal elements and rare earth elements, and comprising 42 to 90 mol % of the silicon, 3 to 38 mol % of the aluminum, 0.5 to 20 mol % of the fourth period element and 2 to 38 mol % of the basic element, based on a total mole of the silicon, the aluminum, the fourth period element and the basic element,
- the process comprising the steps of:
- obtaining a composition including silica, an aluminum compound, at least one compound of fourth period elements selected from the group consisting of iron, cobalt, nickel and zinc, and at least one compound of basic elements selected from the group consisting of alkali metal elements, alkali earth metal elements and rare earth elements;
- and
- obtaining a solid material by calcining the composition or a dried substance of the composition.
A process for producing a silica-based material comprising silicon, aluminum, at least one fourth period element selected from the group consisting of iron, cobalt, nickel and zinc and at least one basic element selected from the group consisting of alkali metal elements, alkali earth metal elements and rare earth elements, and comprising 42 to 90 mol % of the silicon, 3 to 38 mol % of the aluminum, 0.5 to 20 mol % of the fourth period element and 2 to 38 mol % of the basic element, based on a total mole of the silicon, the aluminum, the fourth period element and the basic element,
- the process comprising the steps of:
- obtaining a solid material by calcining a composition including silica, an aluminum compound, and at least one compound of basic elements selected from the group consisting of alkali metal elements, alkali earth metal elements and rare earth elements, or a dried substance of the composition;
- neutralizing a mixture of the solid material and an acidic aqueous solution of a soluble metal salt including at least one fourth period element selected from the group consisting of iron, cobalt, nickel and zinc, to cause a component including the fourth period element to deposit on the solid material;
- subjecting the solid material on which the fourth period element has been deposited to a hydrothermal treatment;
- and
- subjecting the solid material having been subjected to the hydrothermal treatment to a heat treatment.
Dependencies are inferred from the claim text.