Fluorine-based surfactant, and coating composition and resist composition each using the same
AssigneeDIC Corporation
InventorsShin Sasamoto, Hideya Suzuki
Life of this patent
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AssigneeDIC Corporation
InventorsShin Sasamoto, Hideya Suzuki
Estimating the term…
Provided is a fluorine-based surfactant including a copolymer synthesized by copolymerizing, as essential monomers, a polymerizable monomer (A) having a poly(perfluoroalkylene ether) chain and polymerizable unsaturated groups at both ends of the chain and a polymerizable monomer (B) having an oxyalkylene group and a polymerizable unsaturated group. The fluorine-based surfactant cannot structurally generate PFOS or PFOA, which tend to accumulate in the environment and living bodies; even when the fluorine-based surfactant has lower fluorine content than surfactants having a fluoroalkyl group having 8 or more carbon atoms, the fluorine-based surfactant has a higher capability of decreasing surface tension than the surfactants. Accordingly, the fluorine-based surfactant can be suitably used as a leveling agent for a coating composition, a resist composition, or the like.
A fluorine-based surfactant comprising a copolymer synthesized by copolymerizing, as essential monomers, a polymerizable monomer (A) having a poly(perfluoroalkylene ether) chain and polymerizable unsaturated groups at both ends of the chain and a polymerizable monomer (B) having an oxyalkylene group and a polymerizable unsaturated group, wherein the polymerizable monomer (B) includes a polymerizable monomer represented by a general formula (B1) below
(canceled)
Dependencies are inferred from the claim text.