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US 2013/0172225 A1Published application
Dynamic multi-purpose compositions for the removal of photoresists and method for its use
AssigneeDynaloy, LLC
InventorsMichael Phenis, Lauri Johnson, Raymond Chan, Diane Scheele, Kimberly Pollard
Life of this patent
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Abstract
Improved dry stripper solutions for removing one, two or more photoresist layers from substrates are provided. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine, a secondary solvent, and less than about 3 wt. % water. Methods for the preparation and use of the improved dry stripping solutions are additionally provided.
Claims15
A stripper solution for removing a photoresist from a substrate comprising:
- (a) dimethyl sulfoxide;
- (b) a quaternary ammonium hydroxide;
- (c) an alkanolamine having at least two carbon atoms, at least one amino substituent and at least one hydroxyl substituent, the amino and hydroxyl substituents attached to different carbon atoms;
- (d) less than 3 wt % water;
- and
- (e) a secondary solvent.
3 more elements
The solution of claim 10, wherein the secondary solvent is a glycol ether.
Dependencies are inferred from the claim text.