Exhaust system
AssigneeEbara Corporation
InventorsToyoji Shinohara, Kohtaro Kawamura, Toshiharu Nakazawa
Life of this patent
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AssigneeEbara Corporation
InventorsToyoji Shinohara, Kohtaro Kawamura, Toshiharu Nakazawa
Estimating the term…
An exhaust system (2) is used for evacuating a chamber of a manufacturing apparatus (1) for manufacturing semiconductor devices, liquid crystal panels, LEDs, or solar cells. The exhaust system (2) includes a vacuum pump apparatus (3) for evacuating the chamber, an exhaust gas treatment apparatus (5) for treating an exhaust gas discharged from the chamber, and a controller (6) for controlling the vacuum pump apparatus (3) and/or the exhaust gas treatment apparatus (5). Information of operation process of the manufacturing apparatus (1), and the kind of gas and the flow rate of the gas supplied to the manufacturing apparatus (1) is inputted into the controller (6) to control the vacuum pump apparatus (3) and/or the exhaust gas treatment apparatus (5).
An exhaust system for evacuating a chamber of a manufacturing apparatus for manufacturing semiconductor devices, liquid crystal panels, LEDs, or solar cells comprising:
A control method of an exhaust system for evacuating a chamber of a manufacturing apparatus for manufacturing semiconductor devices, liquid crystal panels, LEDs, or solar cells, said exhaust system comprising:
Dependencies are inferred from the claim text.