US 2013/0171832 A1 · Enhanced Isolation For Combinatorial Atomic Layer Deposition (ALD)

Abstract

An apparatus and method for delivering fluids to a semiconductor chamber for combinatorial processing is provided. In some embodiments the apparatus is comprised of a showerhead assembly having a plurality of processing sectors separated by a purge member. The processing sectors are configured to receive one or more processing fluids for combinatorial processing on a substrate. The processing sectors are isolated by a purge fluid conveyed through the purge member. The purge member is configured to selectively control the profile of the purge fluid to enhance isolation of the processing fluids within each sector. The profile of the purge fluid is manipulated by selectively controlling the shape and/or density of the purge curtain, independently between each processing sector.

Claims13

Dependent claims

An apparatus for delivering fluids to a chamber, comprising:

a fluid supply system;
and
a showerhead assembly coupled to the fluid supply system, the showerhead assembly comprising a plurality of processing sectors, wherein each of the plurality of processing sectors is separated by a purge member, wherein the purge members extend radially from a center of the showerhead to a periphery of the showerhead;
and
a plurality of purge holes formed in the purge member, and wherein the plurality of purge holes vary in at least one of the hole size or the spatial distribution of holes

2 more elements

Dependencies are inferred from the claim text.

Enhanced Isolation For Combinatorial Atomic Layer Deposition (ALD)

Life of this patent

Enhanced Isolation For Combinatorial Atomic Layer Deposition (ALD)

Life of this patent

Abstract

Claims13