Processing liquid for suppressing pattern collapse of microstructure, and method for producing microstructure using same
AssigneeMitsubishi Gas Chemical Company, Inc.
InventorsHiroshi Matsunaga, Masaru Ohto
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Abstract
There are provided a processing liquid for suppressing pattern collapse of a microstructure formed of polysilicon which includes at least one compound selected from the group consisting of pyridinium halides containing an alkyl group having 12, 14 or 16 carbon atoms, and water; and a method for producing a microstructure using the processing liquid.
Claims6
A processing liquid for suppressing pattern collapse of a microstructure formed of polysilicon, comprising a pyridinium halide containing at least one alkyl group selected from the group consisting of those alkyl groups having 12, 14 and 16 carbon atoms, and water.
A method for producing a microstructure formed of polysilicon, comprising the steps of:
- subjecting a structure to wet etching or dry etching to obtain the microstructure;
- and
- rinsing the microstructure obtained by the wet etching or dry etching with a processing liquid for suppressing pattern collapse, the processing liquid comprising a pyridinium halide containing at least one alkyl group selected from the group consisting of those alkyl groups having 12, 14 and 16 carbon atoms, and water.
Dependencies are inferred from the claim text.