Semiconductor device and method of fabricating the same
AssigneeSamsung Electronics Co., Ltd.
InventorsSeung-Jun LEE, Woonkyung LEE
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Abstract
A semiconductor device has a substrate that includes a cell array region and a dummy pattern region surrounding the cell array region. The cell array region includes a cell structure having a plurality of cell active pillars extending in a vertical direction from the cell array region of the substrate and includes cell gate patterns and cell gate interlayer insulating patterns alternately stacked on the substrate. The cell gate patterns and cell gate interlayer insulating patterns have sides facing the cell active pillars. The dummy pattern region includes a damp-proof structure.
Claims10
-14. (canceled)
A method of fabricating a semiconductor device, the method comprising:
- preparing a substrate including a cell array region and a dummy pattern region surrounding the cell array region;
- and
- forming a cell structure and a damp-proof structure on the cell array region and the dummy pattern region, respectively,
- wherein the cell structure includes a plurality of cell active pillars extending in a vertical direction from the substrate;
- and cell gate patterns and cell gate interlayer insulating patterns are alternately stacked on the substrate and have sides facing the cell active pillars.
Dependencies are inferred from the claim text.