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US 2013/0171562 A1Published application
Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
AssigneeFUJIFILM Corporation
InventorsTomotaka TSUCHIMURA, Takayuki Ito
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Abstract
An actinic ray- or radiation-sensitive resin composition according to the present invention comprises a sulfonic acid-generating compound that is decomposed by an action of an acid to generate a sulfonic acid having a volume of 240 Å3 or more and a compound that generates the acid when exposed to actinic rays or radiation.
Claims11
An actinic ray- or radiation-sensitive resin composition comprising:
- a sulfonic acid-generating compound that is decomposed by an action of an acid to generate a sulfonic acid having a volume of 240 Å3 or more;
- and
- a compound that generates the acid when exposed to actinic rays or radiation.
Dependencies are inferred from the claim text.