Additive for resist and resist composition comprising same
AssigneeKorea Kumho Petrochemical Co., Ltd.
InventorsJoon Hee HAN, Hyun Sang JOO, Jin Ho KIM, Hyun Soon LIM
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Abstract
A resist additive represented by Formula 1 below and a resist composition including the additive are disclosed. The resist additive improves hydrophobicity of the surface of the resist film to prevent materials from being leached in water during exposure of immersion lithography and is converted to have hydrophilicity by deprotection reaction during development. As a result, a micropattern of a resist film with excellent sensitivity and high resolution is formed. In Formula 1, the substituents are defined as described in the specification.
Claims21
A resist additive represented by Formula 1 below:
- wherein R′, R″ and R′″ are each independently selected from the group consisting of a hydrogen atom, a C1-C4 alkyl group, a halogen group, and a C1-C4 haloalkyl group in which one hydrogen atom is substituted with a halogen group;
- R1 and R2 are each independently a hydrogen atom or a C1-C8 alkyl group;
- R3 is a hydrogen atom or a functional group represented by Formula 2 below:
- wherein R31 is a hydrogen atom, or a hydroxyl protecting group selected from the group consisting of a C1-C20 alkyl group, a (C1-C20 alkoxy)alkyl group, a C3-C30 cycloalkyl group, a formyl group, a (C1-C20 alkyl)carbonyl group, a (C3-C30 cycloalkyl)carbonyl group, a (C1-C20 alkyl)carboxyl group, and a (C3-C30 cycloalkyl)carboxyl group, R32 is selected from the group consisting of a C1-C20 alkanediyl group, a C2-C20 alkenediyl group, a C1-C20 heteroalkanediyl group, a C2-C20 heteroalkenediyl group, a C3-C30 cycloalkanediyl group, a C3-C30 cycloalkenediyl group, a C2-C30 heterocycloalkanediyl group, and a C3-C30 heterocycloalkanediyl group, and R33 is an acid labile group selected from the group consisting of
- wherein Ra, Rb, Rc and Rd are each independently selected from the group consisting of a C1-C20 alkyl group, a C3-C30 cycloalkyl group, a (C1-C10 alkyl)cycloalkyl group, a hydroxyalkyl group, a C1-C20 alkoxy group, a (C1-C10 alkoxy)alkyl group, an acetyl group, an acetylalkyl group, a carboxyl group, a (C1-C10 alkyl)carboxyl group, a (C3-C18 cycloalkyl)carboxyl group, and a C3-C30 heterocycloalkyl group or fused together between adjacent groups to form a C3-C30 saturated or unsaturated hydrocarbon ring or a C2-C20 heterocyclic group, p is an integer of 0 to 3, and q is an integer of 0 to 10;
- R4 is selected from the group consisting of a hydrophobic group, and a C1-C20 alkyl group, a C3-C30 cycloalkyl group, an acyl group, a carboxyl group, a (C1-C20 alkyl)carboxyl group, a (C3-C30 cycloalkyl)carboxyl group, a C1-C20 heteroalkyl group, and a C2-C30 heterocycloalkyl group comprising the hydrophobic group;
- R5 is an acid labile group selected from the group consisting of
- wherein Ra, Rb, Rc and Rd are each independently selected from the group consisting of a C1-C20 alkyl group, a C3-C30 cycloalkyl group, a (C1-C10 alkyl)cycloalkyl group, a hydroxyalkyl group, a C1-C20 alkoxy group, a (C1-C10 alkoxy)alkyl group, an acetyl group, an acetylalkyl group, a carboxyl group, a (C1-C10 alkyl)carboxyl group, a (C3-C18 cycloalkyl)carboxyl group, and a C3-C30 heterocycloalkyl group or fused together between adjacent groups to form a C3-C30 saturated or unsaturated hydrocarbon ring or a C2-C20 heterocyclic group, p is an integer of 0 to 3, and q is an integer of 0 to 10, or selected from the group consisting of a C1-C20 alkyl group, a C3-C30 cycloalkyl group, an acyl group, a carboxyl group, a (C1-C20 alkyl)carboxyl group, a (C3-C30 cycloalkyl)carboxyl group, a (C1-C20 alkyl)carboxyalkyl group, a C1-C20 heteroalkyl group, and a C2-C30 heterocycloalkyl group comprising the acid labile group;
- and
- l, m, n and o are respectively numbers of the repeat units in a backbone, wherein l+m+n+o=1, 0<l/(l+m+n+o)<0.9, 0<m/(l+m+n+o)≦0.2, 0<n/(l+m+n+o)<0.9, and 0≦o/(l+m+n+o)<0.9.
Dependencies are inferred from the claim text.