Additive for resist and resist composition comprising same
AssigneeKorea Kumho Petrochemical Co., Ltd.
InventorsJin Bong SHIN, Dong Chul SEO, Hyun Soon LIM, Joon Hee HAN
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Abstract
Provided are an additive for resist represented by the following formula (1), and a resist composition containing the additive. The additive according to the present invention can suppress leaching caused by water during an immersion lithographic process by increasing hydrophobicity of the surface of the resist film in the exposure at the time of applying the additive to a resist composition, and can form a fine resist pattern having excellent sensitivity and resolution at the time of applying the additive to a resist composition. wherein the substituents respectively have the same meanings as defined above.
Claims26
An additive for resist represented by the following formula (1):
- wherein in the formula (1),
- R′, R″ and R′″ each independently represent a group selected from the group consisting of a hydrogen atom, a C1-C4 alkyl group, a halogen atom, and a C1-C4 haloalkyl group in which one of the hydrogen atoms of an alkyl group is substituted by a halogen atom;
- R1 and R2 each independently represent a hydrogen atom or a C1-C8 alkyl group;
- R3 represents a group selected from the group consisting of a hydrogen atom and functional groups represented by the following formulas (2) and (3):
- wherein in the formulas (2) and (3), R21 represents a hydrogen atom, or a hydroxyl-protecting group selected from the group consisting of a C1-C20 alkyl group, a (C1-C20 alkoxy)alkyl group, a C3-C30 cycloalkyl group, a formyl group, a (C1-C20 alkyl)carbonyl group, a (C3-C30 cycloalkyl)carbonyl group, a (C1-C20 alkyl)carboxyl group, and a (C3-C30 cycloalkyl)carboxyl group;
- R31 represents a hydrophobic group selected from the group consisting of a C1-C20 haloalkyl group, an organosilicon group and a C3-C20 hydrocarbon group, such that if R31 represents an organosilicon group, p represents 0, while if R31 represents a C1-C20 haloalkyl group or a C3-C20 hydrocarbon group, p represents 1;
- R22 and R32 each independently represent a group selected from the group consisting of a C1-C20 alkanediyl group, a C2-C20 alkenediyl group, a C1-C20 heteroalkanediyl group, a C2-C20 heteroalkenediyl group, a C3-C30 cycloalkenediyl group, a C3-C30 cycloalkenediyl group, a C2-C30 heterocycloalkanediyl group, and a C3-C30 heterocycloalkenediyl group;
- R23 and R33 each independently represent an acid-labile group selected from the group consisting of
- wherein Ra, Rb, Rc and Rd each independently represent a group selected from the group consisting of a C1-C20 alkyl group, a C3-C30 cycloalkyl group, a (C1-C10 alkyl)cycloalkyl group, a hydroxyalkyl group;
- a C1-C20 alkoxy group, a (C1-C10 alkoxy)alkyl group, an acetyl group, an acetylalkyl group, a carboxyl group, a (C1-C10 alkyl)carboxyl group, a (C3-C18 cycloalkyl)carboxyl group, and a C3-C30 heterocycloalkyl group, or adjacent groups may be bonded to each other to form a C3-C30 saturated or unsaturated hydrocarbon ring or a C2-C30 heterocyclic group;
- x represents an integer from 0 to 3;
- y represents an integer from 0 to 10;
- R4 represents a hydrophobic group selected from the group consisting of a C1-C20 haloalkyl group, an organosilicon group, and a C3-C20 hydrocarbon group;
- R5 represents a group selected from the group consisting of a hydrogen atom, a C1-C20 alkyl group, a C2-C20 alkenyl group, a C3-C30 cycloalkyl group, a C3-C30 cycloalkenyl group, a C6-C30 aryl group, a C1-C20 heteroalkyl group, a C2-C30 heterocyclic group, and combinations thereof;
- l, m, n and o respectively represent the proportions of corresponding repeating units in the main chain, such that l+m+n+o=1, while 0<l/(l+m+n+o)<0.9, 0.2<m/(l+m+n+o)<0.9, 0≦n/(l+m+n+o)<0.9, and 0≦o/(l+m+n+o)<0.9, provided that when R3 represents a hydrogen atom or a functional group represented by formula (2), n is not 0;
- and
- p represents an integer of 0 or 1.
Dependencies are inferred from the claim text.