Method for depositing a layer on the surface of a substrate
AssigneesUniversite Pierre Et Marie Curie (Paris 6), Universite Paris-Sud 11, Centre National De La Recherche Scientifique
InventorsDavid Grosso, Cédric Boissiere, Clément Sanchez, Pierre Antoine Albouy
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Abstract
A process for depositing a layer on at least part of the surface of a substrate by at least partially submerging the substrate in a solution comprising a solvent and at least one compound intended to form the layer, then drying the substrate, this drying being at least partially carried out in an atmosphere that is isolated from the solution. The submersion in the solution and the drying of the substrate are carried out in the same controlled-atmosphere enclosure.
Claims11
A process for depositing a layer on at least part of the surface of a substrate by at least partially submerging the substrate in a solution comprising a solvent and at least one compound intended to form the layer, then drying the substrate, this drying being carried out at least partially in an atmosphere that is isolated from the solution, wherein the submersion in the solution and the drying of the substrate are carried out in the same controlled-atmosphere enclosure.
Dependencies are inferred from the claim text.