Thin film deposition apparatus and method for using the same

A thin film deposition apparatus, for depositing a thin film on a substrate, the thin film deposition apparatus comprising:

• a preheating chamber configured for preheating the substrate to a first temperature;
• a reacting chamber, configured for receiving the substrate being preheated and transferred from the preheating chamber, heating the substrate to a working temperature, depositing a thin film on the substrate under the working temperature, and cooling the substrate that has been deposited in the reacting chamber from the working temperature to the first temperature;
• a cooling chamber, configured for receiving the substrate being deposited and transferred from the reacting chamber and further cooling the substrate from the first temperature to a second temperature;
• and
• at least one transmission module, configured for transferring the substrate between the preheating chamber, the reacting chamber and the cooling chamber.

A method for using a thin film deposition apparatus, comprising steps of:

• depositing a thin film on the substrate in the reacting chamber and under a working temperature;
• after being deposited, cooling the substrate to the first temperature;
• adjusting the temperature in the cooling chamber and the transmission module to the first temperature;
• transferring the substrate from the reacting chamber to the cooling chamber by the transmission module;
• and
• cooling the substrate to the second temperature in the cooling chamber.