Process cap for flat substrates and plant and method for one-sided treatment of flat substrates
OwnerMarcel SIEME, Michael Kellerer +1inventors
InventorsMarcel SIEME, Michael Kellerer, Jens Eckstein
Life of this patent
Estimating the term…
Abstract
A process cap for protecting a top side of a flat substrate includes a cap and a seal. The seal is circumferentially arranged on a circumferential rim of the cap such that the cap effects a liquid-tight and vapor-tight closure between cap and flat substrate when the cap is fitted on a top side of the flat substrate. The process cap touches the flat substrate only in a circumferential rim area of the same, when it is fitted on the flat substrate and defines a fluid-tight space without any openings between process cap and flat substrate.
Claims14
A process cap for protecting a top side of a flat substrate, comprising:
- a cap;
- a seal, which is circumferentially arranged on a circumferential rim of the cap such that the cap effects a liquid-tight and vapor-tight closure between cap and flat substrate when the cap is fitted on a top side of the flat substrate;
- and
- receiving portions, which are implemented to engage grippers of a cap maneuverer, such that the process cap can be gripped by the grippers and can be maneuvered by the cap maneuverer,
- wherein the process cap touches the flat substrate only in a circumferential rim area of the same, when it is fitted on the flat substrate and defines a fluid-tight space without any openings between process cap and flat substrate.
A plant for one-sided treatment of flat substrates, comprising:
- a cap maneuverer, which is implemented to fit a process cap for protecting a top side of a flat substrate on the top side of the substrate, wherein the process cap comprises a cap and a seal arranged circumferentially on a circumferential edge of the cap such that the cap effects a liquid-tight and vapor-tight closure between cap and flat substrate when the cap is fitted on a top side of the flat substrate, wherein the process cap touches the flat substrate only in a circumferential rim area when it is fitted on the flat substrate and defines a fluid-tight space without any openings between process cap and flat substrate;
- a transporter for transporting the flat substrate with the fitted process cap through one or several treatment stations where the bottom side of the flat substrate and/or an edge of the flat substrate between top side and bottom side is subject to treatment;
- wherein the cap maneuverer is further implemented to detach the process cap from the flat substrate after treatment of the same in the one or several treatment stations.
A method of treating flat substrates, comprising:
- fitting a process cap for protecting a top side of a flat substrate on the top side of the substrate, wherein the process cap comprises a cap and a seal arranged circumferentially on a circumferential edge of the cap such that the cap effects a liquid-tight and vapor-tight closure between cap and flat substrate when the cap is fitted on a top side of the flat substrate, wherein the process cap touches the flat substrate only in a circumferential rim area when it is fitted on the flat substrate and defines a fluid-tight space without any openings between process cap and flat substrate;
- transporting the flat substrate with the fitted process cap through one or several treatment stations where the bottom side of the flat substrate and/or an edge of the flat substrate between top side and bottom side is subject to treatment;
- and
- detaching the process cap from the flat substrate after treatment of the same in the one or several treatment stations.
Dependencies are inferred from the claim text.