# US 2013/0158189 A1 · Method for Polymer Plasma Deposition

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- Number: US 2013/0158189 A1
- Document ID: US20130158189A1
- Status: Published application
- Kind: A1
- Application number: 13/809,309
- Filed: 2011-07-12
- Published: 2013-06-20
- Earliest claimed: 2010-07-12
- Inventors: Francois Reniers; Julie Hubert
- Web page: https://patentgrep.com/patent/US20130158189A1

## CPC

- B05D 1/62: {Plasma-deposition of organic layers (plasma deposition in general C23C14/00, C23C16/00)}
- C09D 127/04: containing chlorine atoms
- B05D 3/0466: {the gas being a non-reacting gas (B05D3/0406 takes precedence)}
- B05D 2201/00: Polymeric substrate or laminate
- B05D 2202/15: Stainless steel
- B05D 2203/30: Other inorganic substrates, e.g. ceramics, silicon
- B05D 2520/10: PVC [Plastisol]
- B05D: PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (conveying articles or workpieces through baths of liquid B65G, e.g. B65G49/02)
- C09D: COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR (cosmetics A61K; processes for applying liquids or other fluent materials to surfaces, in general, B05D; staining wood B27K5/02; glazes or vitreous enamels C03C; natural resins, French polish, drying-oils, driers, turpentine, per se, C09F; polishing compositions other than French polish, ski waxes C09G; adhesives or use of materials as adhesives C09J; materials for sealing or packing joints or covers C09K3/10; materials for stopping leaks C09K3/12; processes for the electrolytic or electrophoretic production of coatings C25D)

## Abstract

The present invention is related to a method or the deposition of a chlorinated polymeric layer onto a ubstrate, said method comprising the steps of:—generating a plasma in a gaseous medium by means of a plasma device;—placing the substrate in contact with the plasma, or in the post-plasma area;—introducing in said plasma or in the post-plasma area a chlorinated precursor of the chlorinated polymer.

## Claims

### Claim 1

Method for the deposition on a substrate of a chlorinated polymeric layer, said method comprising the steps of:
generating a plasma in a gaseous medium by means of a plasma device comprising optionally a post-plasma area said plasma device being maintained at a pressure comprised between 100 hPa and 2000 hPa;
placing the substrate in contact with the plasma, or in the post-plasma area;
introducing in said plasma or in the post-plasma area a precursor of the chlorinated polymer, said precursor comprising a chlorinated organic compound,
characterised in that the oxygen partial pressure in the plasma device is maintained below 10 hPa, preferably below 5 hPa.

### Claim 2 (depends on 1)

Method according to claim 1 wherein the precursor partial pressure in the plasma device is lower than or equal to the saturation vapour pressure of the precursor at the substrate temperature.

### Claim 3 (depends on 1)

Method according to claim 1 wherein the gaseous medium further comprises a plasma generating gas such as Argon or Helium.

### Claim 4 (depends on 1)

Method according to claim 1 wherein the chlorinated precursor comprises a chlorinated organic compound having a Cl/C ratio higher than 0.25, preferably higher than 0.5, more preferably higher than or equal to 1.

### Claim 5 (depends on 1)

Method according to claim 1 wherein said chlorinated precursor comprises a polychlorinated organic compound selected from the group consisting of polychloroalkane, polychloroalkene, polychloroalkyne, polychloroarene, tertiary amine comprising perchloroalkanes groups and mixture thereof.

### Claim 6 (depends on 5)

Method according to claim 5 wherein said polychlorinated organic compound is a perchlorinated organic compound.

### Claim 7 (depends on 5)

Method according to claim 5 wherein said chlorinated precursor comprises a compound having the following structure:
wherein R1, R2 et R3 are selected from the group consisting of perchloroalkane, perchloroalkene, perchloroalkyne perchloroarene.

### Claim 8 (depends on 1)

Method according to claim 1 wherein the temperature of ionic and neutral species in the plasma is below 400° C., preferably below 150° C.

### Claim 9 (depends on 1)

Method according to any claim 1 wherein the plasma is a dielectric barrier discharge (DBD)plasma, a DC pulsed plasma, a microwave plasma or a electron cyclotron resonance (ECR) discharge plasmas.

### Claim 10 (depends on 1)

Article comprising a substrate and a chlorinated polymeric layer producible by the method according to claim 1.

### Claim 11 (depends on 10)

Article according to claim 10 wherein said polymeric layer is cross-linked.

### Claim 12 (depends on 10)

Article according to claim 10 wherein said polymeric layer comprises a polymer selected from the group consisting of PVC, PVDC, polychloropropene, Poly(chloro-p-xylene), Poly(chlorotrifluoroethylene), Poly(vinyl chloroacetate), Poly(2-chlorostyrene) and mixture thereof.

### Claim 13 (depends on 10)

Article according to claim 10 wherein the polymeric layer is a chlorinated polymer having a Cl/C ratio higher than or equal to 0.5.

### Claim 14 (depends on 13)

Article according to claim 13, wherein the Cl/C ratio is higher than or equal to about 1.

### Claim 15 (depends on 14)

Article according to claim 14, wherein the Cl/C ratio is comprised between 0.9 and 1.1.