# US 2013/0157022 A1 · Transparent panel and method of manufacturing the same

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- Number: US 2013/0157022 A1
- Document ID: US20130157022A1
- Status: Published application
- Kind: A1
- Application number: 13/619,093
- Filed: 2012-09-14
- Published: 2013-06-20
- Earliest claimed: 2011-12-16
- Assignees: Samsung Electro-Mechanics Co., Ltd.
- Inventors: Woon Chun KIM; Kang Heon HUR; Kyu Sang LEE
- Web page: https://patentgrep.com/patent/US20130157022A1

## CPC

- C03C 17/22: with other inorganic material (C03C17/34, C03C17/44 take precedence)
- C03C 17/25: by deposition from the liquid phase
- C03C 2217/228: Other specific oxides
- C03C 2217/282: Carbides, silicides
- C03C 2217/29: Mixtures
- C03C 2218/11: from solutions or suspensions
- C03C 2218/324: De-oxidation
- C03C 2218/34: Masking
- G06F 2203/04103: Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
- Y10T 428/24942: including components having same physical characteristic in differing degree
- C03C: CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- G06F: ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models G06N)
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

There are provided a transparent panel and a method of manufacturing the same. The transparent panel includes a transparent substrate; and a transparent electrode layer formed on the transparent substrate, wherein the transparent electrode layer includes a first area having non-electrical conductivity and a second area having electrical conductivity, and the first area includes a graphene oxide, and the second area includes a reduced graphene oxide. Accordingly, a sensing electrode may be formed without a step to thereby minimize a pattern exposure phenomenon, and the manufacturing process may be simplified.

## Claims

### Claim 1

A transparent panel, comprising:
a transparent substrate; and
a transparent electrode layer formed on the transparent substrate,
wherein the transparent electrode layer includes a first area having non-electrical conductivity and a second area having electrical conductivity, and
the first area includes a graphene oxide, and the second area includes a reduced graphene oxide.

### Claim 2 (depends on 1)

The transparent panel of claim 1, wherein the transparent electrode layer has the same thickness in the first area and the second area.

### Claim 3 (depends on 1)

The transparent panel of claim 1, wherein the transparent substrate is a cover lens receiving a touch applied to at least one surface thereof.

### Claim 4 (depends on 1)

The transparent panel of claim 1, wherein the transparent substrate includes at least one of glass, polycarbonate (PC), polyimide (PI), polyethylene terephthalate (PET), polyethersulfone (PES), and polymethymethacrylate (PMMA).

### Claim 5

A method of manufacturing a transparent panel, the method comprising:
preparing a transparent substrate;
forming a graphene oxide layer on the transparent substrate;
providing an etching resist on a first area corresponding to a portion of the graphene oxide layer; and
reducing a second area of the graphene oxide layer other than the first area.

### Claim 6 (depends on 5)

The method of claim 5, wherein the etching resist has acid resistance.

### Claim 7 (depends on 5)

The method of claim 5, wherein the reducing of the second area comprises reducing the second area using a gaseous or liquid reducing agent including at least one of iodic acid (HI), ammonia (NH3), sodium hydroxide (NaOH), potassium hydroxide (KOH), hydrogen sulfide, hydrazine, and aluminum powder.

### Claim 8 (depends on 5)

The method of claim 5, wherein the providing of the etching resist is performed by forming a photoresist on the first area.

### Claim 9 (depends on 5)

The method of claim 5, wherein the providing of the etching resist is performed by laminating a dry film resist (DFR) on the first area.

### Claim 10 (depends on 5)

The method of claim 5, wherein the forming of the graphene oxide layer is performed by at least one of a gravure coating method, a slot die coating method, and a spray coating method.

### Claim 11 (depends on 5)

The method of claim 5, further comprising removing the etching resist from the first area.