# US 2013/0156641 A1 · Sterilization Using Plasma Generated NOx

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- Number: US 2013/0156641 A1
- Document ID: US20130156641A1
- Status: Published application
- Kind: A1
- Application number: 13/712,373
- Filed: 2012-12-12
- Published: 2013-06-20
- Earliest claimed: 2011-12-12
- Assignees: Applied Quantum Energy LLC
- Inventors: George Paskalov
- Web page: https://patentgrep.com/patent/US20130156641A1

## CPC

- A61L 2/14: Plasma, i.e. ionised gases
- A23B 2/05: by heating using irradiation or electric treatment (drying or kilning A23B2/90)
- A23B 2/50: by irradiation without heating
- A23B 4/015: Preserving by irradiation or electric treatment without heating effect
- A61L 2/20: Gaseous substances, e.g. vapours
- A61L: METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES (preservation of bodies or disinfecting characterised by the agents employed A01N; preserving, e.g. sterilising, food or foodstuffs A23; preparations for medical, dental or toiletry purposes A61K)
- A23B: PRESERVATION OF FOODS, FOODSTUFFS OR NON-ALCOHOLIC BEVERAGES; CHEMICAL RIPENING OF FRUIT OR VEGETABLES

## Abstract

Systems and methods for plasma sterilization are described. The sterilization method includes placing a substance to be sterilized into a rotating chamber and irradiating the substance with plasma. An RF generator is used to produce the plasma from a gas. The gas has a concentration of at least 85% N2 and less than 15% O2. The plasma includes a NOx species that is effective in killing microbial organisms in the substance.

## Claims

### Claim 1

A method of sterilizing a substance, comprising:
placing the substance in a rotating chamber;
using an RF generator to produce a plasma from a gas, wherein the gas has a concentration of at least 85% N2 and less than 15% O2 and wherein the plasma comprises a NOx species; and
subjecting the substance to the NOx species.

### Claim 2 (depends on 1)

The method of claim 1, wherein the gas comprises 85%-90% N2, inclusive, and 10%-15% O2, inclusive.

### Claim 3 (depends on 1)

The method of claim 1, wherein the gas comprises 87%-93% N2, inclusive, and 13%-7% 02, inclusive.

### Claim 4 (depends on 1)

The method of claim 1, wherein the gas comprises 89%-90% N2 and 9%-10% O2, inclusive.

### Claim 5 (depends on 1)

The method of claim 1, wherein the gas comprises 0.2%-1% Argon, inclusive.

### Claim 6 (depends on 1)

The method of claim 1, further comprising subjecting the substance to the NOx species through pores in a wall of the chamber.

### Claim 7 (depends on 1)

The method of claim 1, further comprising, operating the RF generator at a basic frequency of 0.44 MHz to 27.12 MHz to produce the plasma.

### Claim 8 (depends on 7)

The method of claim 7, further comprising operating the RF generator at a basic frequency of 13.56 MHz to produce the plasma.

### Claim 9 (depends on 7)

The method of claim 7, further comprising operating the RF generator at a basic frequency of 2-5 MHz to produce the plasma.

### Claim 10 (depends on 7)

The method of claim 7, further comprising, operating the RF generator at a power between 100 Watts and 5 KW, inclusive, to produce the plasma.

### Claim 11

An apparatus for sterilizing a substance, comprising:
a rotating chamber having a lumen; and
an RF generator configured to produce a plasma within or in the vicinity of the chamber, the plasma yielding a NOx species in sufficient quantities to sterilize an amount of the substance within the lumen.

### Claim 12 (depends on 11)

The apparatus of claim 11, further comprising a source of gas for producing the plasma comprising 87%-93% N2, inclusive, and 13%-7% O2, inclusive.

### Claim 13 (depends on 11)

The apparatus of claim 11, further comprising a source of gas for producing the plasma comprising 85%-90% N2, inclusive, and 10%-15% O2, inclusive.

### Claim 14 (depends on 11)

The apparatus of claim 11, further comprising a source of gas for producing the plasma comprises 89%-90% N2 inclusive, and 9%-10% O2, inclusive.

### Claim 15 (depends on 11)

The apparatus of claim 11, further comprising a source of gas for producing the plasma comprises 0.2%-1% Argon, inclusive.

### Claim 16 (depends on 11)

The apparatus of claim 11, wherein the chamber has a porous wall through which the NOx species can pass.

### Claim 17 (depends on 11)

The apparatus of claim 11, wherein the RF generator is configured to operate at a basic frequency of 0.44 MHz to 27.12 MHz, inclusive.

### Claim 18 (depends on 17)

The apparatus of claim 17, wherein the RF generator is configured to operate at a basic frequency of 13.56 MHz.

### Claim 19 (depends on 17)

The apparatus of claim 17, wherein the RF generator is configured to operate at a basic frequency of 2-5 MHz.

### Claim 20 (depends on 17)

The apparatus of claim 17, wherein the RF generator is configured to operate at a power between 100 Watts and 5 KW, inclusive.