# US 2013/0155384 A1 · Exposure apparatus and method of manufacturing device

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- Number: US 2013/0155384 A1
- Document ID: US20130155384A1
- Status: Published application
- Kind: A1
- Application number: 13/714,244
- Filed: 2012-12-13
- Published: 2013-06-20
- Earliest claimed: 2011-12-15
- Assignees: Canon Kabushiki Kaisha
- Inventors: Ryousuke Fukuoka
- Web page: https://patentgrep.com/patent/US20130155384A1

## CPC

- G03F 7/70258: {Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

An exposure apparatus for projecting an image of a pattern on a substrate and for exposing the substrate is disclosed. The exposure apparatus includes a mask stage and a projection optical system. The mask stage holds plural masks so that the plural masks do not contact with each other, and the projection optical system includes plural optical systems. Each of the optical systems projects an image of a pattern of one mask among the plural masks onto an exposure area of the substrate. The apparatus exposes the substrate so that each exposure area of the substrate exposed by each optical system partly overlaps with each other.

## Claims

### Claim 1

An exposure apparatus for projecting an image of a pattern onto a substrate and for exposing the substrate, the apparatus comprising:
a mask stage configured to hold plural masks so that the plural masks do not contact with each other; and
a projection optical system configured to project the image of the pattern on the substrate,
wherein the projection optical system includes a plurality of optical systems,
wherein each of the optical systems projects the image of the pattern of one mask among the plural masks onto an exposure area of the substrate, and
wherein the apparatus exposes the substrate so that each exposure area of the substrate exposed by each optical system partly overlaps with each other.

### Claim 2 (depends on 1)

The apparatus according to claim 1, wherein at least one of the plurality of the optical systems forms a projection area where the pattern of the mask is projected onto the substrate at a position different from a position where an illumination area of the mask is extended in the vertical direction.

### Claim 3 (depends on 2)

The apparatus according to claim 2, wherein the apparatus is a scanning type exposure apparatus which expose the substrate while scanning the substrate and the mask in a scanning direction,
wherein the position where an illumination area of the mask is extended in the vertical direction and the projection area where the pattern of the mask is projected onto the substrate are different in the scanning direction.

### Claim 4 (depends on 2)

The apparatus according to claim 2, wherein the apparatus is a scanning type exposure apparatus which exposes the substrate while scanning the substrate and the mask in a scanning direction,
wherein the position where an illumination area of the mask is extended in the vertical direction and the projection area where the pattern of the mask is projected onto the substrate are different in a direction perpendicular to the scanning direction.

### Claim 5 (depends on 2)

The apparatus according to claim 2, wherein the projection optical system comprises a optical member configured to bend a light path,
wherein the projection area where the pattern of the mask is projected on the substrate is formed at a position different from a position where an illumination area of the mask is extended in the vertical direction using the optical member.

### Claim 6 (depends on 1)

The apparatus according to claim 1, further comprising a plurality of the mask stages configured to hold so as to move independently each of the plurality of the masks.

### Claim 7 (depends on 1)

The apparatus according to claim 1, wherein the projection optical system is a reflection type projection optical system.

### Claim 8 (depends on 5)

The apparatus according to claim 5, wherein the optical member comprises a flat reflecting surface.

### Claim 9

A method of manufacturing a device, the method comprising:
exposing a substrate using an exposure apparatus; and
developing the exposed substrate,
wherein the exposure apparatus projects an image of a pattern onto the substrate and exposes the substrate,
wherein the exposure apparatus comprises:
a mask stage configured to hold plural masks so that the plural masks do not contact with each other; and
a projection optical system configured to project the image of the pattern on the substrate,
wherein the projection optical system includes a plurality of optical systems,
wherein each of the plurality of optical systems projects the image of the pattern of one mask among the plural masks on an exposure area of the substrate, and
wherein the apparatus exposes the substrate so that each exposure area of the substrate exposed by each optical system partly overlaps with each other.