# US 2013/0155383 A1 · Exposure apparatus and exposure method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2013/0155383 A1 - Document ID: US20130155383A1 - Status: Published application - Kind: A1 - Application number: 13/381,350 - Filed: 2011-12-16 - Published: 2013-06-20 - Earliest claimed: 2011-12-15 - Assignees: Shenzhen China Star Optoelectronics Technology Co., Ltd. - Inventors: Jehao Hsu; Minghung Shih; Jingfeng Xue - Web page: https://patentgrep.com/patent/US20130155383A1 ## CPC - G03F 7/2032: {Simultaneous exposure of the front side and the backside} - G03F 7/70425: {Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning} - G03F 7/70325: {Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract The present invention provides an exposure apparatus and an exposure method. The method comprises: utilizing an exposure light source to provide light rays to the photo-resist layer; and utilizing a reflective plate to reflect the light rays passing through the photo-resist layer and the transparent substrate back to the photo-resist layer. The present invention can reduce a line space of a pattern of the photo-resist layer. ## Claims ### Claim 1 An exposure apparatus for exposing a photo-resist layer on a transparent substrate, wherein the exposure apparatus comprises: a mask disposed at one side of the photo-resist layer, wherein the mask includes at least one transparent opening, and a width of the transparent opening is less than 2 um; an exposure light source configured to provide light rays to the photo-resist layer, wherein the light rays provided by the exposure light source pass through the mask to reach the photo-resist layer; and a reflective plate disposed at an opposite side of the photo-resist layer for reflecting the light rays passing through the photo-resist layer and the transparent substrate back to the photo-resist layer, wherein the reflective plate is parallel to the photo-resist layer on the transparent substrate when exposing it. ### Claim 2 (depends on 1) The exposure apparatus according to claim 1, wherein a reflective surface of the reflective plate is a flat surface. ### Claim 3 (depends on 1) The exposure apparatus according to claim 1, wherein the reflective plate includes a plurality of convex structures. ### Claim 4 (depends on 1) The exposure apparatus according to claim 1, wherein the reflective plate includes a plurality of concave structures. ### Claim 5 An exposure apparatus for exposing a photo-resist layer on a transparent substrate, wherein the exposure apparatus comprises: a mask disposed at one side of the photo-resist layer; an exposure light source configured to provide light rays to the photo-resist layer, wherein the light rays provided by the exposure light source pass through the mask to reach the photo-resist layer; and a reflective plate disposed at an opposite side of the photo-resist layer for reflecting the light rays passing through the photo-resist layer and the transparent substrate back to the photo-resist layer. ### Claim 6 (depends on 5) The exposure apparatus according to claim 5, wherein the mask includes at least one transparent opening, and a width of the transparent opening is less than 3 um. ### Claim 7 (depends on 5) The exposure apparatus according to claim 5, wherein the width of the transparent opening is equal to or less than 2 um. ### Claim 8 (depends on 5) The exposure apparatus according to claim 5, wherein a reflective surface of the reflective plate is a flat surface. ### Claim 9 (depends on 5) The exposure apparatus according to claim 5, wherein the reflective plate includes a plurality of convex structures. ### Claim 10 (depends on 5) The exposure apparatus according to claim 5, wherein the reflective plate includes a plurality of concave structures. ### Claim 11 (depends on 5) The exposure apparatus according to claim 5, wherein the reflective plate is parallel to the photo-resist layer on the transparent substrate when exposing the photo-resist layer. ### Claim 12 An exposure method for exposing a photo-resist layer on a transparent substrate, wherein the exposure method comprises the following steps: utilizing an exposure light source to provide light rays to the photo-resist layer, wherein the light rays provided by the exposure light source pass through the mask to reach the photo-resist layer; and utilizing a reflective plate to reflect the light rays passing through the photo-resist layer and the transparent substrate back to the photo-resist layer. ### Claim 13 (depends on 12) The exposure method according to claim 12, wherein the mask includes at least one transparent opening, and a width of the transparent opening is less than 3 um. ### Claim 14 (depends on 12) The exposure method according to claim 12, wherein the reflective plate is parallel to the photo-resist layer on the transparent substrate when exposing the photo-resist layer. ### Claim 15 (depends on 12) The exposure method according to claim 12, wherein, when utilizing the reflective plate to reflect the light rays, the transparent substrate is carried on the reflective plate.