# US 2013/0154175 A1 · Process kit components for use with an extended and independent rf powered cathode substrate for extreme edge tunability > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2013/0154175 A1 - Document ID: US20130154175A1 - Status: Published application - Kind: A1 - Application number: 13/651,354 - Filed: 2012-10-12 - Published: 2013-06-20 - Earliest claimed: 2011-12-15 - Assignees: Applied Materials, Inc. - Inventors: VALENTIN TODOROW; SAMER BANNA; IMAD YOUSIF; ALBERT WANG; GARY LERAY - Web page: https://patentgrep.com/patent/US20130154175A1 ## CPC - H10P 72/722: {Details of electrostatic chucks} - H01J 37/32642: {Focus rings} - H01J 37/32715: {Workpiece holder} - H02N 13/00: Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect - H10P 72/72: using electrostatic chucks - Y10T 279/23: with magnetic or electrostatic means - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - H02N: ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR - Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION ## Abstract Process kit components for use with a substrate support of a process chamber are provided herein. In some embodiments, a process kit ring may include a ring shaped body having an outer edge, an inner edge, a top surface and a bottom, wherein the outer edge has a diameter of about 12.473 inches to about 12.479 inches and the inner edge has a diameter of about 11.726 inches to about 11.728 inches, and wherein the ring shaped body has a height of about 0.116 to about 0.118 inches; and a plurality of protrusions disposed on the top surface of the ring shaped body, each of the plurality of protrusions disposed symmetrically about the ring shaped body. ## Claims ### Claim 1 A process kit ring for use with a substrate support of a process chamber, comprising: a ring shaped body having an outer edge, an inner edge, a top surface and a bottom, wherein the outer edge has a diameter of about 12.473 inches to about 12.479 inches and the inner edge has a diameter of about 11.726 inches to about 11.728 inches, and wherein the ring shaped body has a thickness of about 0.116 to about 0.118 inches; and a plurality of protrusions disposed on the top surface of the ring shaped body, each of the plurality of protrusions disposed symmetrically about the ring shaped body. ### Claim 2 (depends on 1) The process kit ring of claim 1, wherein the plurality of protrusions comprise three protrusions, and wherein the three protrusions are disposed about 120 degrees from one another about the ring shaped body. ### Claim 3 (depends on 1) The process kit ring of claim 1, wherein each of the plurality of protrusions has a height of about 0.049 inches to about 0.059 inches. ### Claim 4 (depends on 1) The process kit ring of claim 1, wherein each of the plurality of protrusions comprises a sloped side, wherein the sloped side is angled about 9 degrees to about 11 degrees from an axis that is perpendicular to the surface of the ring shaped body. ### Claim 5 (depends on 1) The process kit ring of claim 1, wherein the ring is fabricated from silicon carbide (SiC). ### Claim 6 (depends on 1) The process kit ring of claim 1, wherein the inner edge comprises a flat portion disposed proximate one of the plurality of protrusions, the flat portion having a length of about 1.310 inches to about 1.320 inches. ### Claim 7 (depends on 1) The process kit ring of claim 1, wherein a distance between a center of the ring shaped body and an outer edge of each of the plurality of protrusions is about 6.995 inches to about 6.105 inches, and wherein a distance between the center of the ring shaped body and an inner edge of each of the plurality of protrusions is about 5.937 inches to about 5.947. ### Claim 8 A process kit ring for use with a substrate support of a process chamber, comprising: a ring shaped body having an outer edge, an inner edge, a top surface and a bottom, wherein the outer edge has a diameter of about 15.115 inches to about 15.125 inches and wherein the inner edge has a diameter of about 11.752 inches to about 11.757 inches, and wherein the ring shaped body has a thickness of about 0.510 inches to about 0.520 inches; a first step and a second step formed in the ring shaped body between the outer edge and inner edge, wherein the first step has an outer diameter of about 12.077 inches to about 12.087 inches, and wherein the second step has an outer diameter of about 11.884 inches to about 11.889 inches; and a ring extending downward from the bottom of the ring shaped body proximate the outer edge of the ring shaped body, the ring having an inner diameter of about 14.905 inches to about 14.915 inches. ### Claim 9 (depends on 8) The process kit ring of claim 8, wherein a transition from a top surface of the second step to the top surface of the ring shaped body has an angle of about 99 degrees to about 101 degrees with respect to the top surface of the ring shaped body. ### Claim 9 (canceled) ### Claim 10 (depends on 8) The process kit ring of claim 8, wherein the inner edge comprises a flat portion configured to interface with a portion of the substrate support. ### Claim 11 A process kit ring for use with a substrate support of a process chamber, comprising: a ring shaped body having an outer edge, an inner edge, a top surface and a bottom, wherein the outer edge has a diameter of about 15.115 inches to about 15.125 inches and wherein the inner edge has a diameter of about 12.245 inches to about 12.250 inches, and wherein the ring shaped body has a thickness of about 0.520 inches to about 0.530 inches; and a plurality of protrusions disposed symmetrically about the inner edge of the ring shaped body, the plurality of protrusions extending inwardly from the inner edge towards a center of the ring shaped body. ### Claim 12 (depends on 11) The process kit ring of claim 11, wherein the process kit ring is fabricated from quartz (SiO2). ### Claim 13 (depends on 11) The process kit ring of claim 11, wherein the plurality of protrusions comprise three protrusions disposed about 120 degrees from one another about the inner edge of the ring shaped body. ### Claim 14 (depends on 11) The process kit ring of claim 11, wherein a distance from a center of the ring shaped body to a terminal end of each of the plurality of protrusions is about 5.937 inches to about 5.947. ### Claim 15 (depends on 11) The process kit ring of claim 11, wherein each of the plurality of protrusions has a terminal end that is rounded. ### Claim 16 (depends on 11) The process kit ring of claim 11, wherein a substrate supporting surface of each of the plurality of protrusions is disposed beneath the top surface of the ring shaped body. ### Claim 17 (depends on 11) The process kit ring of claim 11, further comprising a notch formed in the ring shaped body beneath the inner edge of the ring shaped body, the notch having an outer diameter of about 12.405 inches to about 12.505 inches. ### Claim 18 (depends on 11) The process kit ring of claim 11, further comprising a curved transition between a substrate supporting surface of each of the plurality of protrusions and the top surface of the ring shaped body. ### Claim 19 (depends on 11) The process kit ring of claim 11, further comprising a tapered portion extending from the inner edge of the ring shaped body to the top surface of the ring shaped body, wherein an angle between the tapered portion and the top surface of the ring shaped body is about 99 degrees to about 101 degrees. ### Claim 20 (depends on 11) The process kit ring of claim 11, further comprising: a ring extending downward from the bottom of the ring shaped body proximate an outer edge of the body, the ring having an inner diameter of about 14.905 inches to about 14.915 inches.