# US 2013/0153794 A1 · Extreme ultraviolet light generation apparatus

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- Number: US 2013/0153794 A1
- Document ID: US20130153794A1
- Status: Published application
- Kind: A1
- Application number: 13/817,813
- Filed: 2011-11-10
- Published: 2013-06-20
- Earliest claimed: 2010-11-25
- Assignees: Gigaphoton Inc.
- Inventors: Osamu Wakabayashi
- Web page: https://patentgrep.com/patent/US20130153794A1

## CPC

- H05G 2/0086: {Optical arrangements for conveying the laser beam to the plasma generation location}
- H05G: X-RAY TECHNIQUE (investigating or analysing materials by the use of X-rays G01N23/00; apparatus for X-ray photography G03B42/02; X-ray tubes H01J35/00; TV systems having X-ray input H04N5/321)

## Abstract

An apparatus uses first and second laser beams from a laser apparatus to generate extreme ultraviolet light. The apparatus may include a chamber provided with at least one inlet through which at least one of first and second laser beams outputted from the laser apparatus travels into the chamber. A beam shaping unit is provided on a beam path of the first laser beam for transforming the first laser beam into a hollow laser beam. A first focusing optical element is provided downstream of the beam shaping unit for focusing the hollow laser beam in a first location inside the chamber.

## Claims

### Claim 1

An apparatus for generating extreme ultraviolet light by using first and second laser beams from a laser apparatus, the apparatus comprising:
a chamber provided with at least one inlet through which at least one of the first and second laser beams outputted from the laser apparatus travels into the chamber;
a beam shaping unit, provided on a beam path of the first laser beam, for transforming the first laser beam into a hollow laser beam; and
a first focusing optical element, provided downstream of the beam shaping unit, for focusing the hollow laser beam on a first location inside the chamber.

### Claim 2 (depends on 1)

The apparatus according to claim 1, further comprising a second focusing optical element, provided on a beam path of the second laser beam, for focusing the second laser beam on a second location inside the chamber.

### Claim 3 (depends on 2)

The apparatus according to claim 2, wherein the first and second locations coincide with each other.

### Claim 4 (depends on 2)

The apparatus according to claim 2, wherein
the at least one inlet includes first and second inlets through which the first and second laser beams respectively travel into the chamber,
the first focusing optical element is provided with a through-hole,
the first optical element is disposed between the second focusing optical element and the first location inside the chamber such that at least a part of the second laser beam outputted from the second focusing optical element travels through the through-hole in the first focusing optical element.

### Claim 5 (depends on 1)

The apparatus according to claim 1, wherein the first focusing optical element is disposed so as to focus the second laser beam on a first predetermined position inside the chamber.

### Claim 6 (depends on 1)

The apparatus according to claim 1, wherein the beam shaping unit includes a transmissive optical element.

### Claim 7 (depends on 1)

The apparatus according to claim 1, wherein the beam shaping unit includes a reflective optical element.

### Claim 8 (depends on 2)

The apparatus according to claim 2, wherein the first and second focusing optical elements include reflective optical elements, respectively.

### Claim 9 (depends on 1)

The apparatus according to claim 1, wherein the beam shaping unit includes a reflective axicon optical element.

### Claim 10 (depends on 1)

The apparatus according to claim 1, wherein the beam shaping unit includes a transmissive axicon optical element.

### Claim 11 (depends on 1)

The apparatus according to claim 1, wherein the first focusing optical element is disposed so as to focus the second laser beam on a second predetermined location inside the chamber.