# US 2013/0153783 A1 · System for fast ions generation and a method thereof

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 2013/0153783 A1
- Document ID: US20130153783A1
- Status: Published application
- Kind: A1
- Application number: 13/752,426
- Filed: 2013-01-29
- Published: 2013-06-20
- Earliest claimed: 2009-12-20
- Assignees: HIL Applied Medical, Ltd.; Yissum Research Development Company of the Hebrew University of Jersusalem Ltd.
- Inventors: Arie Zigler; Shmuel Eisenmann; Tala Palchan; Sagi Brink-Danan; Eyal Gad Nahum
- Web page: https://patentgrep.com/patent/US20130153783A1

## CPC

- H01J 27/24: using photo-ionisation, e.g. using laser beam
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)

## Abstract

The present invention discloses a system and method for generating a beam of fast ions. The system comprising: a target substrate having a patterned surface, a pattern comprising nanoscale pattern features oriented substantially uniformly along a common axis; and; a beam unit adapted for receiving a high power coherent electromagnetic radiation beam and providing an electromagnetic radiation beam having a main pulse and a pre-pulse and focusing it onto said patterned surface of the target substrate to cause interaction between said radiation beam and said substrate enabling creation of fast ions.

## Claims

### Claim 1

A system for generating a beam of fast ions, the system comprising:
a target substrate having a patterned surface, a pattern comprising nanoscale pattern features oriented substantially uniformly along a common axis; and;
a beam unit adapted for receiving a high power coherent electromagnetic radiation beam and providing an electromagnetic radiation beam having a main pulse and a pre-pulse and focusing it onto said patterned surface of the target substrate to cause interaction between said radiation beam and said substrate enabling creation of fast ions.

### Claim 2 (depends on 1)

The system of claim 1, wherein when said electromagnetic radiation beam enters the focal region, said target comprises a “burn off” layer having patterned nanoscale features in focal region, leaving a sub-critical density plasma.

### Claim 3 (depends on 1)

The system of claim 1, wherein said beam unit is configured to control an intensity of the pre-pulse to be in the range of about 1011-1016 W/cm2.

### Claim 4 (depends on 1)

The system of claim 1, wherein said beam unit is configured to control the time period between the pre-pulse and the main pulse to be in the range of about 1-100 ns.

### Claim 5 (depends on 1)

The system of claim 1, wherein said main pulse has duration less than or about equal to at least one of 1 ps; 0.5 ps; 0.2 ps; 0.1 ps; 0.03 ps.

### Claim 6 (depends on 1)

The system of claim 1, comprising a high power coherent electromagnetic radiation source for generating said high power coherent electromagnetic radiation beam comprising a main pulse and a pre-pulse.

### Claim 7 (depends on 6)

The system of claim 6, wherein said high power coherent electromagnetic radiation source comprises a laser source.

### Claim 8 (depends on 7)

The system of claim 7, wherein said laser source generates an electromagnetic radiation beam having a contrast ratio of maximum 10−3.

### Claim 9 (depends on 7)

The system of claim 7, wherein said laser source generates a laser pulse having intensity between about 5×1019 W/cm2 and about 5×1021 W/cm2.

### Claim 10 (depends on 6)

The system of claim 6, wherein said electromagnetic radiation source is configured to control the energy of the pre-pulse and generates a radiation beam having a pre-pulse with an intensity in the range of about 1011-1016 W/cm2.

### Claim 11 (depends on 10)

The system of claim 10, wherein said electromagnetic radiation source is configured to control the time period between the pre-pulse and the main pulse to be in the range of about 1-100 ns.

### Claim 12 (depends on 1)

The system of claim 1, wherein said beam unit is adapted to direct the electromagnetic radiation beam onto said patterned surface of the target substrate with a predetermined grazing angle; the grazing angle being selected in accordance with said pattern such that said interaction provides an efficient coupling between said radiation beam and said substrate enabling creation of fast ions of desirably high kinetic energy.

### Claim 13 (depends on 12)

The system of claim 12, wherein said grazing angle is lesser than 45°.

### Claim 14 (depends on 1)

The system of claim 1, wherein said electromagnetic beam has a pre-defined polarization direction defining a certain angle between said polarization direction and at least one of the orientation axis of the pattern features of the target substrate and a plane of incidence of said electromagnetic beam is selected such that said interaction provides an efficient coupling between said radiation beam and said substrate enabling creation of fast ions having a desirably high kinetic energy.

### Claim 15 (depends on 14)

The system of claim 14, wherein said angle between the polarization direction and the orientation axis is in a range of 0°-30°.

### Claim 16 (depends on 14)

The system of claim 14, wherein said polarization direction is substantially parallel to the orientation axis.

### Claim 17 (depends on 1)

The system of claim 1, wherein said beam unit is configured and operable to focus the radiation beam to a spot size in the target for which the radiation beam has a maximum intensity about equal to or greater than at least one of 1018 W/cm2, 1019 W/cm2, 1020 W/cm2, 1021 W/cm2.

### Claim 18 (depends on 1)

The system of claim 1, wherein said fast ions have kinetic energy about equal to or greater than at least one of 5 MeV, 50 MeV, 100 MeV, 150 MeV, 200 MeV.