# US 2013/0153767 A1 · Wavelength-Selective, Integrated resonance Detector for Electromagnetic Radiation

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- Number: US 2013/0153767 A1
- Document ID: US20130153767A1
- Status: Published application
- Kind: A1
- Application number: 13/329,503
- Filed: 2011-12-19
- Published: 2013-06-20
- Earliest claimed: 2011-12-19
- Assignees: Nanohmics, Inc.
- Inventors: Steve M. Savoy; Byron G. Zollars; Andrew J. Milder; Gennady Shvets
- Web page: https://patentgrep.com/patent/US20130153767A1

## CPC

- G01J 3/12: Generating the spectrum; Monochromators
- G01J 1/0414: {using plane or convex mirrors, parallel phase plates, or plane beam-splitters}
- G01J 1/0429: {using polarisation elements}
- G01J 1/0488: {with spectral filtering}
- G01J 1/42: using electric radiation detectors (optical or mechanical part G01J1/04; by comparison with a reference light or electric value G01J1/10)
- G01J 3/021: {using plane or convex mirrors, parallel phase plates, or particular reflectors}
- G01J 3/0224: {using polarising or depolarising elements}
- G01J 3/26: using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filters
- G01J 3/2803: {using photoelectric array detector}
- G01J 3/51: using colour filters
- G01J 5/024: {Special manufacturing steps or sacrificial layers or layer structures}
- G01J 5/0802: Optical filters
- G01J 5/0813: Planar mirrors; Parallel phase plates
- G01J 5/20: using resistors, thermistors or semiconductors sensitive to radiation, e.g. photoconductive devices
- G01J 5/59: using polarisation; Details thereof
- G01J: MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY (light sources F21, H01J, H01K, H05B; investigating properties of materials by optical means G01N)

## Abstract

Embodiments of the invention are directed to integrated resonance detectors and arrays of integrated resonance detectors and to methods for making and using the integrated resonance detectors and arrays. Integrated resonance detectors comprise a substrate, a conducting mirror layer, an active layer, and a patterned conducting layer. Electromagnetic radiation is detected by transducing a specific resonance-induced field enhancement in the active layer to a detection current that is proportional to the incident irradiance.

## Claims

### Claim 1

An integrated resonance detector for electromagnetic radiation, comprising:
a substrate comprising an electrically conducting mirror layer;
an active layer on the mirror layer, the active layer being a material capable of supporting electrical current flow;
a patterned conducting layer on the active layer, the conducting layer being patterned to absorb the electromagnetic radiation within a selected range of wavelengths; and
an electronic circuit electrically connected between the mirror layer and the patterned conducting layer.

### Claim 2 (depends on 1)

The detector of claim 1 wherein the substrate is a rigid solid comprising plastic, ceramic, metal, glass, or a semiconductor.

### Claim 3 (depends on 2)

The detector of claim 2 wherein the rigid solid is a focal plane array sensor or an image sensor comprising a semiconductor.

### Claim 4 (depends on 2)

The detector of claim 2 wherein the substrate comprises a semiconductor and the semiconductor comprises silicon, InGaAs, InSb, or HgCdTe.

### Claim 5 (depends on 2)

The detector of claim 2 wherein the rigid solid is an array of bolometers.

### Claim 6 (depends on 1)

The detector of claim 1 wherein the substrate is a flexible solid comprising metal, ceramic, plastic, or biomaterial.

### Claim 7 (depends on 1)

The detector of claim 1 wherein the material of the active layer comprises a conductor, semiconductor, semi-insulator, or insulator.

### Claim 8 (depends on 1)

The detector of claim 1 wherein the active layer comprises a plurality of layers.

### Claim 9 (depends on 1)

The detector of claim 1 wherein the electronic circuit includes a source of bias voltage.

### Claim 10 (depends on 8)

The detector of claim 8 wherein two of the layers form a rectifying junction.

### Claim 11 (depends on 7)

The detector of claim 7 wherein the active layer is a mixture of materials.

### Claim 12 (depends on 7)

The detector of claim 7 wherein the material of the active layer comprises microparticles or nanoparticles.

### Claim 13 (depends on 1)

The detector of claim 1 wherein the patterned conducting layer is an array of lines of conducting material, the lines of material being electrically connected so as to avoid interference with the resonance coupling of the electromagnetic radiation.

### Claim 14 (depends on 13)

The detector of claim 13 wherein the array of lines is oriented in a selected direction so as to respond to polarized electromagnetic radiation.

### Claim 15 (depends on 1)

An array comprising a plurality of the integrated resonance detectors of claim 1, the resonance detectors being adapted to absorb the electromagnetic radiation within a plurality of selected ranges of wavelengths.

### Claim 16

A method for making an integrated resonance detector for electromagnetic radiation, comprising:
(a) providing a substrate comprising a conducting mirror layer, the mirror layer having electrical continuity to a first electrode;
(b) depositing an active layer on the mirror layer;
(c) depositing a conducting layer on the active layer, the conducting layer having electrical continuity to a second electrode;
(d) patterning the conducting layer, wherein the patterned conducting layer is selected to absorb electromagnetic radiation within a selected range of wavelengths; and
(e) connecting an electrical circuit between the first electrode and the second electrode.

### Claim 17

A method for making an integrated resonance detector for electromagnetic radiation, comprising:
(a) providing a substrate comprising a conducting mirror layer, the mirror layer having electrical continuity to a first electrode;
(b) depositing an active layer on the mirror layer;
(c) patterning the active layer;
(d) depositing a conducting layer on the patterned active layer, the conducting layer having electrical continuity to a second electrode and defining a specific wavelength of absorption; and
connecting an electrical circuit between the first electrode and the second electrode.

### Claim 18 (depends on 16)

The method of claim 16 wherein the conducting layer is patterned by dry etching.

### Claim 19 (depends on 16)

The method of claim 16 wherein the conducting layer is patterned with a liftoff process.

### Claim 20 (depends on 16, 17)

The method of claim 16 or 17 wherein the active layer is deposited using evaporation, sputtering, chemical vapor deposition, spin-on, or casting.

### Claim 21 (depends on 16, 17)

The method of claim 16 or 17 further comprising depositing a second active layer on the patterned conductive layer.

### Claim 22 (depends on 21)

The method of claim 21 further comprising depositing a second patterned conducting layer on and in registration with the second active layer.

### Claim 23 (depends on 16)

The method of claim 16 wherein the conducting layer is patterned by photolithography or nanoimprint lithography.

### Claim 24 (depends on 16)

The method of claim 16 wherein the electrical circuit comprises a focal plane array, image sensor, or bolometer.