# US 2013/0153537 A1 · Method for forming anodized layer and mold production method

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- Number: US 2013/0153537 A1
- Document ID: US20130153537A1
- Status: Published application
- Kind: A1
- Application number: 13/819,547
- Filed: 2011-08-22
- Published: 2013-06-20
- Earliest claimed: 2010-08-30
- Assignees: Sharp Kabushiki Kaisha
- Inventors: Akinobu Isurugi; Kiyoshi Minoura; Hidekazu Hayashi; Kenichiro Nakamatsu
- Web page: https://patentgrep.com/patent/US20130153537A1

## CPC

- C25F 3/02: Etching
- B29C 33/424: {Moulding surfaces provided with means for marking or patterning (for injection moulding B29C45/372)}
- B29C 33/56: Coatings {, e.g. enameled or galvanised}; Releasing, lubricating or separating agents {(in-mould coating B29C37/0028; using or applying separating agents B29C37/0067)}
- C25D 11/024: {Anodisation under pulsed or modulated current or potential}
- C25D 11/24: Chemical after-treatment
- C25D 11/12: Anodising more than once, e.g. in different baths
- C25F: PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- B29C: SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING (making preforms B29B11/00; making laminated products by combining previously unconnected layers which become one product whose layers will remain together B32B37/00 - B32B41/00)
- C25D: PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR

## Abstract

An anodized layer formation method includes: providing an aluminum film provided on a support or an aluminum base; and forming a porous alumina layer which has minute recessed portions by applying a voltage between an anode which is electrically coupled to a surface of the aluminum film or the aluminum base and a cathode which is provided in an electrolytic solution with the surface of the aluminum film or the aluminum base being in contact with the electrolytic solution. The forming of the porous alumina layer includes increasing the voltage to a target value and, before the voltage is increased to the target value, increasing the voltage to a first peak value which is lower than the target value and thereafter decreasing the voltage to a value which is lower than the first peak value. As such, an anodized layer with reduced variation of recessed portions can be formed.

## Claims

### Claim 1

A method for manufacturing a mold which has an inverted moth-eye structure over its surface, the inverted moth-eve structure having a plurality of minute recessed portions whose two-dimensional size viewed in a direction normal to the surface is not less than 10 nm and less than 500 nm, the method, comprising the steps of:
providing an aluminum film provided on a support or an aluminum base;
a step of forming a porous alumina layer which has minute recessed portions by means of anodization by applying a voltage between an anode which is electrically coupled to a surface of the aluminum film or the aluminum base and a cathode which is provided in an electrolytic solution with the surface of the aluminum film or the aluminum base being in contact with the electrolytic solution; and
an etching step after the porous alumina layer is formed, in which the porous alumina layer is brought into contact with an etching solution such that the minute recessed portions are enlarged,
wherein the step of forming the porous alumina layer by means of anodization includes
increasing the voltage to a target value, and
before the voltage is increased to the target value, increasing the voltage to a first peak value which is lower than the target value and thereafter decreasing the voltage to a value which is lower than the first peak value.

### Claim 2 (depends on 1)

The method of claim 1, wherein in the step of decreasing the voltage to a value which is lower than the first peak value, the voltage is decreased to substantially zero.

### Claim 3 (depends on 1)

The method of claim 1, wherein the step of forming the porous alumina layer by means of anodization further includes, after the step of decreasing the voltage to a value which is lower than the first peak value and before the step of increasing the voltage to the target value, increasing the voltage to a second peak value which is higher than the first peak value and which is equal to or lower than the target value and thereafter decreasing the voltage to a value which is lower than the second peak value.

### Claim 4 (depends on 3)

The method of claim 3, wherein in the step of increasing the voltage to the second peak value, the second peak value is generally equal to the target value.

### Claim 5

(canceled)

### Claim 6 (depends on 1)

The method of claim 1, wherein a time rate change in a voltage in at least a portion of at least one of a period where the voltage is increased to the target value and a period where the voltage is increased to the first peak value is larger than 0.57 V/s and smaller than 20 V/s.

### Claim 7 (depends on 1)

The method of claim 1 wherein, in the step of providing, the support or the aluminum base has the shape of a generally circular pole.

### Claim 8

(canceled)

### Claim 9 (depends on 1)

A method for producing an antireflection element, comprising the step of:
providing a mold which is manufactured according to the manufacturing method of claim 1 and a work; and
irradiating a UV-curable resin provided between the mold and a surface of the work with ultraviolet light supplied through the mold, thereby curing the UV-curable resin.
