# US 2013/0153412 A1 · Apparatus for enabling concentricity of plasma dark space

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 2013/0153412 A1
- Document ID: US20130153412A1
- Status: Published application
- Kind: A1
- Application number: 13/327,689
- Filed: 2011-12-15
- Published: 2013-06-20
- Earliest claimed: 2011-12-15
- Assignees: Applied Materials, Inc.
- Inventors: ALAN RITCHIE; DONNY YOUNG; KEITH A. MILLER; MUHAMMAD RASHEED; STEVE SANSONI; Uday Pai
- Web page: https://patentgrep.com/patent/US20130153412A1

## CPC

- C23C 14/34: Sputtering
- H01J 37/3417: {Arrangements}
- H01J 37/3423: {Shape}
- H01J 37/3435: {Target holders (includes backing plates and endblocks)}
- H01J 37/3441: {Dark space shields}
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)

## Abstract

In some embodiments, substrate processing apparatus may include a chamber body; a lid disposed atop the chamber body; a target assembly coupled to the lid, the target assembly including a target of material to be deposited on a substrate; an annular dark space shield having an inner wall disposed about an outer edge of the target; a seal ring disposed adjacent to an outer edge of the dark space shield; and a support member coupled to the lid proximate an outer end of the support member and extending radially inward such that the support member supports the seal ring and the annular dark space shield, wherein the support member provides sufficient compression when coupled to the lid such that a seal is formed between the support member and the seal ring and the seal ring and the target assembly.

## Claims

### Claim 1

A substrate processing apparatus, comprising:
a chamber body;
a lid disposed atop the chamber body;
a target assembly coupled to the lid, the target assembly including a target of material to be deposited on a substrate;
an annular dark space shield having an inner wall disposed about an outer edge of the target;
a seal ring disposed adjacent to an outer edge of the dark space shield; and
a support member coupled to the lid proximate an outer end of the support member and extending radially inward such that the support member supports the seal ring and the annular dark space shield, wherein the support member provides sufficient compression when coupled to the lid such that a seal is formed between the support member and the seal ring and the seal ring and the target assembly.

### Claim 2 (depends on 1)

The substrate processing apparatus of claim 1, wherein the seal ring is made of a dielectric material.

### Claim 3 (depends on 1)

The substrate processing apparatus of claim 1, wherein the dark space shield is made of a dielectric material.

### Claim 4 (depends on 3)

The substrate processing apparatus of claim 3, wherein the dielectric material is ceramic.

### Claim 5 (depends on 1)

The substrate processing apparatus of claim 1, wherein the dark space shield is made of a conductive material.

### Claim 6 (depends on 5)

The substrate processing apparatus of claim 5, wherein the conductive material is at least one of stainless steel or aluminum.

### Claim 7 (depends on 1)

The substrate processing apparatus of claim 1, further comprising an alignment feature to maintain a uniform radial gap between the inner wall of the dark space shield and the outer edge of the target.

### Claim 8 (depends on 7)

The substrate processing apparatus of claim 7, wherein the alignment feature comprises:
a plurality of pins coupled to a bottom surface of the target and having portions extending in a substantially normal direction from the bottom surface of the target; and
a corresponding plurality of slots disposed within a top surface of the dark space shield and configured to receive the extending portions of the plurality of pins.

### Claim 9 (depends on 8)

The substrate processing apparatus of claim 8, wherein each pin includes a hollow passageway disposed axially through the pin.

### Claim 10 (depends on 1)

The substrate processing apparatus of claim 1, wherein the support member further comprises a plurality of biasing features that bias the annular dark space shield against the target assembly.

### Claim 11 (depends on 10)

The substrate processing apparatus of claim 10, wherein each biasing feature comprises a ball retained in a recess in the support member and having a spring disposed between the ball and a bottom of the recess to bias the ball away from the bottom of the recess such that a portion of the ball extends from the recess.

### Claim 12 (depends on 1)

The substrate processing apparatus of claim 1, further comprising a lower alignment feature coupling the support member to a chamber body adapter.

### Claim 13

A substrate processing apparatus, comprising:
a lid configured to be movable coupled to a substrate process chamber;
a target assembly coupled to the lid, the target assembly including a target of material to be deposited on a substrate;
an annular dark space shield having an inner wall disposed about an outer edge of the target;
a support member coupled to the lid proximate an outer end of the support member and extending radially inward, the support member including a feature that, when the support member is coupled to the lid, biases the annular dark space shield against the target assembly; and
a seal ring disposed adjacent to an outer edge of the dark space shield and between the support member and the target assembly, wherein the support member provides sufficient compression when coupled to the lid such that a seal is formed between the support member and the seal ring and the seal ring and the target assembly.

### Claim 14 (depends on 13)

The substrate processing apparatus of claim 13, wherein the target assembly further comprises a target material disposed on a backing plate.

### Claim 15 (depends on 13)

The substrate processing apparatus of claim 13, wherein the support member further comprises an annular plate with a lip extending upward proximate an inner diameter of the annular plate.

### Claim 16 (depends on 13)

The substrate processing apparatus of claim 13, wherein the support member further comprises a plurality of biasing features that bias the annular dark space shield against the target assembly.

### Claim 17 (depends on 16)

The substrate processing apparatus of claim 16, wherein each biasing feature comprises a ball retained in a recess in the support member and having a spring disposed between the ball and a bottom of the recess to bias the ball away from the bottom of the recess such that a portion of the ball extends from the recess.

### Claim 18 (depends on 13)

The substrate processing apparatus of claim 13, further comprising an alignment feature to maintain a uniform radial gap between the inner wall of the dark space shield and an outer edge of the target.

### Claim 19 (depends on 18)

The substrate processing apparatus of claim 18, wherein the radial gap between the inner wall of the dark space shield and the outer edge of the target is about 30 to about 40 mils.

### Claim 20 (depends on 19)

The substrate processing apparatus of claim 19, wherein the alignment feature comprises:
a plurality of pins coupled to a bottom surface of the target and having portions extending in a substantially normal direction from the bottom surface of the target; and
a corresponding plurality of slots disposed within a top surface of the dark space shield and configured to receive the extending portions of the plurality of pins.