# US 2013/0152971 A1 · Substrate holding and rotating device, substrate treatment apparatus including the device, and substrate treatment method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2013/0152971 A1 - Document ID: US20130152971A1 - Status: Published application - Kind: A1 - Application number: 13/596,848 - Filed: 2012-08-28 - Published: 2013-06-20 - Earliest claimed: 2011-12-19 - Assignees: SCREEN Holdings Co., Ltd. - Inventors: Hiroshi KATO - Web page: https://patentgrep.com/patent/US20130152971A1 ## CPC - H10P 72/7608: {characterised by a plurality of separate clamping members, e.g. clamping fingers} - H10P 72/7626: {characterised by the construction of the shaft} - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract A substrate holding and rotating device includes: a turntable rotatable; a rotative drive unit which rotates the turntable; a holding member which is provided on the turntable and horizontally holds a substrate in upwardly spaced relation to the turntable; a vertically movable protection disk disposed between the turntable and a substrate holding position; and a magnetic levitation mechanism including a first magnet attached to the protection disk, an annular second magnet which generates a repulsive force with respect to the first magnet, a support member which non-rotatably supports the second magnet, and a relative movement mechanism which moves the support member and the turntable relative to each other. ## Claims ### Claim 1 A substrate holding and rotating device, comprising: a turntable rotatable about a vertical rotation axis; a rotative drive unit which rotates the turntable; a holding member which is provided on the turntable and horizontally holds a substrate in upwardly spaced relation to the turntable; a protection disk disposed between the turntable and a substrate holding position at which the substrate is held by the holding member, and attached to the turntable so as to be vertically movable relative to the turntable between a lower position and an adjacent position close to a lower surface of the substrate held by the holding member above the lower position, the protection disk having substantially the same size as the substrate held by the holding member; and a magnetic levitation mechanism including a first magnet attached to the protection disk, a second magnet which has an annular shape coaxial about the rotation axis and generates a repulsive force with respect to the first magnet, a first support member which non-rotatably supports the second magnet, and a first relative movement mechanism which moves the first support member and the turntable relative to each other so as to change a distance between the first magnet and the second magnet, the magnetic levitation mechanism being configured to levitate the protection disk from the turntable by the repulsive force generated between the first magnet and the second magnet. ### Claim 2 (depends on 1) The substrate holding and rotating device according to claim 1, wherein the holding member includes a movable holding member which is movable between a holding position at which the movable holding member holds the substrate and a retracted position to which the movable holding member is retracted from the holding position, the substrate holding and rotating device further comprising a magnetic drive mechanism including a first magnetic member attached to the movable holding member, a second magnetic member which has an annular shape coaxial about the rotation axis and generates a magnetic force with respect to the first magnetic member, a second support member which non-rotatably supports the second magnetic member, and a second relative movement mechanism which moves the second support member and the turntable relative to each other so as to change a distance between the first magnetic member and the second magnetic member, the magnetic drive mechanism being configured to hold the movable holding member at the holding position by the magnetic force generated between the first magnetic member and the second magnetic member. ### Claim 3 (depends on 2) The substrate holding and rotating device according to claim 2, wherein the second magnetic member, the second support member and the second relative movement mechanism serve as the second magnet, the first support member and the first relative movement mechanism, respectively, wherein the magnetic drive mechanism and the magnetic levitation mechanism share the second magnet, the first support member and the first relative movement mechanism, wherein the protection disk is held at the adjacent position by the repulsive force generated between the second magnet and the first magnet, and the movable holding member is held at the holding position by the magnetic force generated between the second magnet and the first magnetic member when the second magnet is located at a predetermined position. ### Claim 4 (depends on 1) The substrate holding and rotating device according to claim 1, further comprising a limitation member which limits upward relative movement of the protection disk with respect to the turntable at the adjacent position. ### Claim 5 (depends on 1) The substrate holding and rotating device according to claim 1, further comprising a guide mechanism which is provided on the turntable and guides the vertical relative movement of the protection disk. ### Claim 6 (depends on 1) The substrate holding and rotating device according to claim 1, further comprising a lateral side covering member which is attached to the turntable and covers a space defined between the substrate held by the holding member and the turntable from a lateral side. ### Claim 7 A substrate treatment apparatus comprising: a substrate holding and rotating device; and a treatment liquid supply unit which supplies a treatment liquid to an upper surface of a substrate held by the substrate holding and rotating device; the substrate holding and rotating device comprising: a turntable rotatable about a vertical rotation axis; a rotative drive unit which rotates the turntable; a holding member which is provided on the turntable and horizontally holds the substrate in upwardly spaced relation to the turntable; a protection disk disposed between the turntable and a substrate holding position at which the substrate is held by the holding member, and attached to the turntable so as to be vertically movable relative to the turntable between a lower position and an adjacent position close to a lower surface of the substrate held by the holding member above the lower position, the protection disk having substantially the same size as the substrate held by the holding member; and a magnetic levitation mechanism including a first magnet attached to the protection disk, a second magnet which has an annular shape coaxial about the rotation axis and generates a repulsive force with respect to the first magnet, a first support member which non-rotatably supports the second magnet, and a first relative movement mechanism which moves the first support member and the turntable relative to each other so as to change a distance between the first magnet and the second magnet, the magnetic levitation mechanism being configured to levitate the protection disk from the turntable by the repulsive force generated between the first magnet and the second magnet. ### Claim 8 (depends on 7) The substrate treatment apparatus according to claim 7, further comprising a receiving member which receives a treatment liquid supplied from the treatment liquid supply unit to the substrate held by the substrate holding and rotating device and flowing outward from the surface of the substrate, wherein the first support member is fixed to the receiving member, wherein the first relative movement mechanism is configured to move the receiving member and the turntable relative to each other. ### Claim 9 (depends on 7) The substrate treatment apparatus according to claim 7, further comprising an inert gas supply unit which supplies an inert gas to a space defined between a substrate held and rotated by the substrate holding and rotating device and the protection disk located at the adjacent position. ### Claim 10 (depends on 9) The substrate treatment apparatus according to claim 9, wherein the protection disk has a restriction portion provided on an upper surface thereof for restricting an inert gas flow passage on a peripheral edge of the substrate held by the holding member. ### Claim 11 (depends on 9) The substrate treatment apparatus according to claim 9, wherein the inert gas supply unit includes an inert gas nozzle which ejects the inert gas radially toward a peripheral edge of the substrate held by the holding member from a rotation center of the turntable. ### Claim 12 A substrate treatment method to be performed by utilizing a substrate holding and rotating device, the substrate holding and rotating device including a turntable rotatable about a vertical rotation axis, a holding member which horizontally holds a substrate, a protection disk attached to the turntable in relatively vertically movable manner and having substantially the same size as the substrate, a first magnet attached to the protection disk, and an annular second magnet non-rotatably provided coaxially about the rotation axis, the substrate treatment method comprising: a holding step of causing the holding member to horizontally hold the substrate; a rotating step of rotating the substrate held by the holding member by rotating the turntable; a lower surface covering step of moving the first magnet and the second magnet toward each other to levitate the protection disk from the turntable to an adjacent position close to a lower surface of the substrate by a repulsive force generated between the first magnet and the second magnet to cover the lower surface of the substrate; and a treatment liquid supplying step of supplying a treatment liquid to an upper surface of the substrate with the lower surface of the substrate covered with the protection disk in the holding step and the rotating step. ### Claim 13 (depends on 12) The substrate treatment method according to claim 12, wherein the holding member includes a movable holding member which is movable between a holding position at which the movable holding member holds the substrate and a retracted position to which the movable holding member is retracted from the holding position, wherein the holding step includes the step of holding the movable holding member at the holding position by applying a magnetic force to a magnetic member attached to the movable holding member. ### Claim 14 (depends on 13) The substrate treatment method according to claim 13, wherein the lower surface covering step includes the step of locating the second magnet at a predetermined position to levitate the protection disk at the adjacent position by the repulsive force generated between the second magnet and the first magnet, wherein the holding step includes the step of locating the second magnet at the predetermined position to hold the movable holding member at the holding position by a magnetic force generated between the second magnet and the magnetic member. ### Claim 15 (depends on 12) The substrate treatment method according to claim 12, further comprising the step of causing a limiting member to limit upward relative movement of the protection disk with respect to the turntable at the adjacent position. ### Claim 16 (depends on 12) The substrate treatment method according to claim 12, further comprising the step of causing a receiving member to receive a treatment liquid flowing outward from the substrate during the rotation of the substrate, wherein the second magnet is supported by the receiving member, wherein the lower surface covering step includes the step of moving the receiving member and the turntable toward each other. ### Claim 17 (depends on 12) The substrate treatment method according to claim 12, further comprising an inert gas supplying step of supplying an inert gas to a space defined between the substrate being rotated and the protection disk located at the adjacent position in the treatment liquid supplying step. ### Claim 18 (depends on 17) The substrate treatment method according to claim 17, wherein the protection disk has a restriction portion provided on an upper surface portion thereof to be opposed to a peripheral edge of the substrate held by the holding member, the method further comprising the step of restricting an inert gas flow passage by the restriction portion in the inert gas supplying step. ### Claim 19 (depends on 17) The substrate treatment method according to claim 17, wherein the inert gas supplying step includes the step of ejecting the inert gas radially toward a peripheral edge of the substrate held by the holding member from a rotation center of the turntable. ### Claim 20 (depends on 12) The substrate treatment method according to claim 12, further comprising the step of covering a space defined between the substrate held by the holding member and the turntable from a lateral side by a lateral side covering member attached to the turntable in the lower surface covering step.