# US 2013/0152858 A1 · Apparatus for performing a plasma chemical vapour deposition process > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2013/0152858 A1 - Document ID: US20130152858A1 - Status: Published application - Kind: A1 - Application number: 13/715,374 - Filed: 2012-12-14 - Published: 2013-06-20 - Earliest claimed: 2011-12-14 - Assignees: Draka Comteq B.V. - Inventors: IGOR MILICEVIC; MATTHEUS JACOBUS NICOLAAS VAN STRALEN; JOHANNES ANTOON HARTSUIKER - Web page: https://patentgrep.com/patent/US20130152858A1 ## CPC - C23C 16/511: using microwave discharges - C03B 37/0183: {for plasma within a tube substrate} - H01J 37/32247: {Resonators} - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - C03B: MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract The invention relates to an apparatus for performing a plasma chemical vapour deposition process. The apparatus comprises a mainly cylindrical resonator being provided with an outer cylindrical wall enclosing a resonant cavity extending in a circumferential direction around a cylindrical axis. The resonator is further provided with side wall portions bounding the resonant cavity in the cylindrical direction, and with a slit configuration extending in a circumferential direction around the cylindrical axis providing access from the resonant cavity radially inwardly. Further, the slit configuration includes slit sections that are mutually offset in the cylindrical direction. ## Claims ### Claim 1 An apparatus for performing a plasma chemical vapour deposition process, comprising a mainly cylindrical resonator being provided with an outer cylindrical wall enclosing a resonant cavity extending in a circumferential direction around a cylindrical axis, the resonator further being provided with side wall portions bounding the resonant cavity in the cylindrical direction, and with a slit configuration extending in a circumferential direction around the cylindrical axis providing access from the resonant cavity radially inwardly, wherein the slit configuration includes slit sections that are mutually offset in the cylindrical direction. ### Claim 2 (depends on 1) An apparatus according to claim 1, wherein each of the slit sections extends in the circumferential direction in a range of a semi-circle. ### Claim 3 (depends on 1) An apparatus according to claim 1, wherein a circumferential end position of a first slit section substantially coincides with the circumferential starting position of a second slit section. ### Claim 4 (depends on 1) An apparatus according to claim 1, wherein a circumferential dimension of the slit sections is larger than a width dimension of the slit sections. ### Claim 5 (depends on 1) An apparatus according to claim 1, wherein the slit is formed by a pair of slit sections that face each other when seen in the cylindrical direction. ### Claim 6 (depends on 1) An apparatus according to claim 1, wherein the offset between slit sections is circa a quarter of the plasma (microwave) wavelength. ### Claim 7 (depends on 1) An apparatus according to claim 1, wherein the offset between slit sections is larger than circa 5 mm, preferably in a range from circa 30 mm to circa 50 mm. ### Claim 8 (depends on 1) An apparatus according to claim 1, wherein the apparatus further comprises a microwave guide having an end extending through the outer cylindrical wall into the resonant cavity. ### Claim 9 (depends on 1) Apparatus according to claim 1, wherein each slit section allows microwave energy to pass radially inwardly, and wherein the intensities of the corresponding passing microwave energy substantially match. ### Claim 10 (depends on 1) Apparatus according to claim 1, wherein the width of the slit sections mutually differs. ### Claim 11 (depends on 8) An apparatus according to claim 8, wherein the locations of the slit sections are symmetric with respect to a plane of symmetry of the microwave guide. ### Claim 12 (depends on 1) An apparatus according to claim 1, wherein the resonant cavity as a whole has a substantially rotational symmetric shape. ### Claim 13 (depends on 1) An apparatus according to claim 1, wherein the resonator includes two substantially identical semi resonator units that are placed offset with respect to each other in the cylindrical direction. ### Claim 14 (depends on 1) An apparatus according to claim 1, wherein the resonator is provided with an inner cylindrical wall bounding the resonance cavity in a radial direction towards the cylindrical axis, and wherein the slit is arranged in the inner cylindrical wall. ### Claim 15 (depends on 8) An apparatus according to claim 8, further comprising a microwave generator connector to a second end of the microwave guide. ### Claim 16 (depends on 1) An apparatus according to claim 1, wherein a substrate tube is received in a tubular inner space, radially inwardly from the resonant cavity, and wherein the substrate tube is arranged to rotate, during operation of the apparatus, with respect to the cylindrical axis of the resonator. ### Claim 17 (depends on 16) An apparatus according to claim 16, wherein the resonator is arranged for reciprocating along the substrate tube, in the cylindrical direction.