Chemical gas deposition reactor

A reactor (1) comprising:

• a chamber (3) having a lower wall (15), an upper wall (17) and a side wall (19) connecting the lower wall (15) to the upper wall (17);
• a support plate (9) for one or more substrate elements which is mounted inside the chamber (3);
• at least one first supply line (29-1) for a first type of gas, and at least one second supply line (29-2), separate from the first supply line, for a second type of gas;
• a gas injection device (5) and a gas collector (7);
• characterized in that:
• the gas injection device (5) includes at least one injector connected to the first supply line (29-1) and at least one injector (30) connected to the second supply line (29-2), said injectors leading into the chamber (3) through at least one inlet (31) provided in the side wall (19);
• all of the injectors (30) of the first supply line (29-1) and all of the injectors of the second supply line (29-2) lead into the chamber one above the other;
• the collector (7) includes at least one outlet provided in the side wall (19) at a location opposite said inlet (31) relative to the support plate (9) and substantially at the level of said inlet (31).