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AssigneeASML Netherlands B.V.
InventorsRaymond Wilhelmus Louis LAFARRE, Hubert Marie Segers, Theodorus Petrus Maria Cadee, Yang-Shan Huang, Christiaan Louis Valentin
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A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, the lithographic apparatus including a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table. The gripper includes a vacuum clamp arranged to clamp the substrate at a top side thereof. The vacuum clamp may be arranged to clamp at least part of a circumferential outer zone of the substrate top surface. There is also provided a substrate handling method including positioning the substrate using a gripper on a substrate table of a lithographic apparatus, the method including clamping the substrate at a top side thereof using a vacuum clamp of the gripper.
A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, the lithographic apparatus comprising a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table, the gripper comprising a vacuum clamp arranged to clamp the substrate at a top side thereof.
A substrate handling method comprising:
A substrate handler for handling a substrate, the substrate handler comprising a gripper configured to grip the substrate and to position the substrate on a substrate table, wherein the gripper comprises a vacuum clamp arranged to clamp the substrate at a top side thereof.
Dependencies are inferred from the claim text.