Grafted photoinitiators
AssigneeColoplast A/S
InventorsChristian B. Nielsen, Niels Joergen Madsen, Carsten Hoej
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Abstract
The invention provides a method for producing a polymeric photoinitiator, of the general formula I: Polymer-[CR2-CHR-Spacer(PI)n]m (I) wherein m is an integer from 1-5000; n is a real number above 0 and below 5; R is as defined herein, and PI is a photoinitiator moiety. The method comprises grafting one or more photoinitiator moieties (PI), each of which comprises at least one activated alkene functional group, onto the polymer. Polymeric photoinitiators are also provided.
Claims55
A method for producing a polymeric photoinitiator, of the general formula I:
- Polymer-[CR2—CHR-Spacer(PI)n]m (I)
- wherein m is an integer from 1-5000;
- n is a real number above 0 and below 5;
- and
- PI is a photoinitiator moiety;
- and wherein each R group is a substituent independently selected from hydrogen, C1-C25 linear alkyl, C3-C25 branched alkyl, C3-C25 cycloalkyl, aryl, heteroaryl, —OH, —CN, halogens, amines (e.g. —NR′R″, where R′ and R″ are alkyl groups, suitably C1-C25 alkyl groups) and amides (e.g. —CONR′R″ or R′CONR″—, where R′ and R″ are alkyl groups, suitably C1-C25 alkyl groups),
- said method comprising grafting one or more photoinitiator moieties (PI), each of which comprises at least one activated alkene functional group, onto the polymer.
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A method of curing a matrix composition, said method comprising the steps of:
- a. providing a matrix composition comprising the polymeric photoinitiator according to any of the general formulas (II), (IIa), (IIb), (III), (IV), or (V),
- Polymer-[CR2—CHR—C(═O)-Spacer(PI)n]m (II)
- Polymer-[CR2—CHR—C(═O)—O-Spacer(PI)n]m (IIa)
- Polymer-[CR2—CHR—C(═O)—NH-Spacer(PI)n]m (IIb)
- Polymer-[CR2—CHR—O-Spacer(PI)n]m (III)
- Polymer-[CR2—CHR—NR1-Spacer(PI)n]m (IV)
- Polymer-[CR2—CHR-Ph-Spacer(PI)n]m (V)
- wherein m is an integer from 1-5000;
- n is a real number above 0 and below 5;
- each R group is a substituent independently selected from hydrogen, C1-C25 linear alkyl, C3-C25 branched alkyl, C3-C25 cycloalkyl, aryl, heteroaryl, —OH, —CN, halogens, amines (e.g. —NR′R″, where R′ and R″ are alkyl groups, suitably C1-C25 alkyl groups) and amides (e.g. —CONR′R″ or R′CONR″—, where R′ and R″ are alkyl groups, suitably C1-C25 alkyl groups);
- and PI is a photoinitiator moiety;
- R1 is a substituent independently selected from hydrogen, C1-C25 linear alkyl, C3-C25 branched alkyl, C3-C25 cycloalkyl, aryl, heteroaryl, —OH, —CN and halogens;
- and
- Ph is an optionally substituted phenyl group;
- b. curing the matrix composition obtained in step a. by exposing it to UV radiation.
Dependencies are inferred from the claim text.